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A flatness thermal shaping treatment process for a gas diffuser

A gas diffuser and processing technology technology, applied in the field of gas diffuser shaping and processing, can solve the problems of poor shaping effect, low shaping efficiency of the gas diffuser, easy deformation, etc. Effect

Active Publication Date: 2021-06-15
芜湖通潮精密机械股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the above-mentioned technical problems, the present invention provides a flatness thermal shaping treatment process for gas diffusers, which mainly solves the problem that the existing gas diffusers are easily deformed after being heated in the chemical vapor deposition process, and that the deformed gas diffusion The low shaping efficiency and poor shaping effect of the device affect its service life. The purpose is to design a thermal shaping treatment process. By laying pads of different thicknesses on the corresponding positions of the bearing platform of the electric heating furnace, the The diffuser is placed on the pad, and then aluminum foil paper is laid on the gas diffuser, and counterweights of corresponding weight are laid layer by layer on the aluminum foil paper, and the deformed gas diffuser is heated at one time through the heating process of the electric heating furnace It is processed into an inverted bowl shape, which reduces the risk of bumping and injury due to multiple lifting, flanging, testing and transportation in the middle, and the flatness and surface shape of the corrected gas diffuser are not easy to rebound, which can improve its use. Longer life, lower maintenance cost

Method used

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  • A flatness thermal shaping treatment process for a gas diffuser
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  • A flatness thermal shaping treatment process for a gas diffuser

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Embodiment Construction

[0032] In order to make the objects, technical solutions, and advantages of the present invention more clear, the technical solutions in the embodiments are clear and complete, and the following examples are intended to illustrate the invention. However, it is not intended to limit the scope of the invention.

[0033] In the description of the present invention, it is to be described in that, unless otherwise expressly specified and defined, the term "mount", "connected", "connection" should be broadly understood, for example, may be fixed connection, or detachable Connect, or integrate; may be mechanical connections, or electrical connections; may be directly connected, or indirectly via an intermediate medium. The specific meaning of the above terms in the present invention will be appreciated to those skilled in the art.

[0034] Specific embodiments of the invention are: figure 2 , image 3 with Figure 4 As shown, a plane heat shaping process process of a gas diffuser includes ...

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Abstract

The invention relates to a flatness thermal shaping treatment process of a gas diffuser, which belongs to the technical field of gas diffuser plastic processing. The product to be shaped is placed on the block, the product is covered with aluminum foil, the weight block is laid layer by layer on the aluminum foil, and the electric heating furnace is heated and kept warm. The beneficial effect of the present invention is that the deformed gas diffuser can be heated at one time. It is processed into an inverted bowl shape, and the deformation is more uniform, which reduces the risk of bumping and injury due to multiple hoisting, flanging, inspection and transportation in the middle, and ensures the flatness and surface shape of the gas diffuser, which is not easy to deform. Improve its service life and reduce maintenance costs.

Description

Technical field [0001] The present invention relates to the field of gas diffuser shaping processing technology, and more particularly to a plane heat shaped treatment process of a gas diffuser. Background technique [0002] content: [0003] During the manufacturing process of the liquid crystal display panel, some functional films are deposited in the surface of the glass substrate using chemical vapordeposition, referred to as CVD). In general, in the chemical vapor deposition, in order to improve the uniformity of the deposited film, a gas diffuser is employed in the chemical vapor deposition apparatus to uniformly deposit the gas on the substrate after uniform diffusion, in order to make the substrate film formation. Uniform, it is necessary to control the size and uniformity of the gas diffuser diffusion pore size, and is controlled by the plane size and surface shape of the product. [0004] Such as figure 1 As shown, the structure of the existing chemical vapor deposition...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B21D1/00
CPCB21D1/00
Inventor 张宽杨彬
Owner 芜湖通潮精密机械股份有限公司
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