Method for determining monocrystalline silicon charging data, device thereof and equipment
A determination method and technology of single crystal silicon, applied in the direction of single crystal growth, single crystal growth, polycrystalline material growth, etc., can solve the problems of poor accuracy and long time.
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Embodiment 1
[0090] Reference figure 1 , figure 1 A step flow chart of a method for determining feed data for single crystal silicon in the first embodiment of the present invention is shown. The method may include the following steps:
[0091] Step 101: Obtain the process state of the single crystal furnace.
[0092] In this step, the single crystal furnace equipment can be used to obtain the process step status of the single crystal furnace, so that it can be determined whether the single crystal furnace can be charged according to the process step status of the single crystal furnace.
[0093] Specifically, in the Czochralski method for producing single crystal silicon rods, the raw materials are first loaded into the quartz crucible in the single crystal furnace, the furnace body is sealed, and protective gas is introduced, and the blocks are heated to 1400 It melts at about ℃, and the raw material is formed after the pre-loaded raw material in the quartz crucible is melted. After seeding, s...
Embodiment 2
[0106] See figure 2 , Shows a step flow chart of a method for determining feed data for single crystal silicon in the second embodiment of the present invention, and the method may include the following steps:
[0107] Step 201: Obtain the process state of the single crystal furnace.
[0108] For details of this step, refer to the above step 101, which will not be repeated here.
[0109] After step 201, step 202 or step 203 can be performed.
[0110] Step 202: In the case that the process step state is an abnormal state, and it is determined that an instruction to start the feeding operation sent by the single crystal furnace is received, the operating parameter data of the single crystal furnace is acquired.
[0111] In this step, if the process step status of the single crystal furnace obtained from the single crystal furnace equipment is abnormal, that is, an abnormal situation occurs during the operation of the single crystal furnace, and the single crystal furnace does not follow ...
Embodiment 3
[0210] Reference Figure 5 , Shows a step flow chart of an intelligent batching and feeding method in the third embodiment of the present invention, which is applied to a feeding system including a single crystal furnace, a device for determining feeding data of single crystal silicon, and a feeding device. The method may include the following step:
[0211] In step 301, the process state of the single crystal furnace is collected.
[0212] For details of this step, refer to the above step 101, which will not be repeated here.
[0213] Step 302, whether the single crystal furnace is in the step of unloading the silicon rod.
[0214] In this step, according to the single crystal furnace process step status collected by the single crystal furnace, it is judged whether the single crystal furnace is in the unloading process step of silicon rods. If yes, proceed to step 303; if not, proceed to step 306, and the feeding device does not Do any response.
[0215] Step 303, data collection of ...
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