Supercharge Your Innovation With Domain-Expert AI Agents!

Bragg reflector vertical cavity surface emitting semiconductor laser distributed on asymmetric annular structure

A technology of Bragg reflector and ring structure, which is applied in the direction of semiconductor lasers, lasers, laser components, etc., can solve problems such as device technology, achieve device process simplification, and avoid process damage.

Active Publication Date: 2020-05-08
CHANGCHUN UNIV OF SCI & TECH
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to improve the beam quality of the vertical cavity surface emitting semiconductor laser with distributed Bragg reflectors on the ring structure and solve the device process problems caused by the structural characteristics of the device, we have invented an asymmetric ring structure distributed Bragg reflector vertical cavity surface emitting semiconductor laser. laser

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Bragg reflector vertical cavity surface emitting semiconductor laser distributed on asymmetric annular structure
  • Bragg reflector vertical cavity surface emitting semiconductor laser distributed on asymmetric annular structure
  • Bragg reflector vertical cavity surface emitting semiconductor laser distributed on asymmetric annular structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] In the asymmetric annular structure distributed Bragg mirror vertical cavity surface emitting semiconductor laser of the present invention, the upper electrode 1, the ohmic contact layer 2, the upper distributed Bragg reflector 3, the oxide confinement layer 4, the active gain region 5, the lower The distributed Bragg reflector 6, the substrate 7, and the lower electrode 8 are arranged coaxially along the main axis of the device sequentially from top to bottom, as shown in figure 2 , image 3 shown. The material of the upper electrode 1 is Ti / Pt / Au, which is layered and then alloyed; the material of the ohmic contact layer 2 is GaAs; the material of the upper distributed Bragg reflector 3 is P-type Al 0.1 Ga 0.9 As / Al 0.8 Ga 0.2 As; the material of the oxide confinement layer 4 is Al 2 o 3 The material of the active gain region 5 is GaAs / AlGaAs; the material of the lower distributed Bragg reflector 6 is N-type Al 0.1 Ga 0.9 As / Al 0.8 Ga 0.2As; the material of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a Bragg reflector vertical cavity surface emitting semiconductor laser distributed on an asymmetric annular structure, and belongs to the technical field of semiconductor lasers. The Bragg reflector vertical cavity surface emitting semiconductor laser is characterized in that an ohmic contact layer, an upper distributed Bragg reflector and an active gain region are cylindrical entities; the middle part of the Bragg reflector vertical cavity surface emitting semiconductor laser is a flush-top eccentric high-resistance region; the flush-top eccentric high-resistance region is approximately cylindrical; the top surface of the flush-top eccentric high-resistance region is flush with the top surface of the ohmic contact layer, the bottom surface of the flush-top eccentric high-resistance region is in contact with the inner mirror surface of the lower distributed Bragg reflector, the vertical axis of the flush-top eccentric high-resistance region is parallel to the main axis of the device, and the eccentric distance delta between the vertical axis of the flush-top eccentric high-resistance region and the main axis of the device is 10-20 microns; and the shaping layer is located on the top surface of the flush eccentric high-resistance region, the shape and the radial dimension of the shaping layer are the same as those of the top surface of the flush eccentrichigh-resistance region, and the thickness and the material of the shaping layer are the same as those of the upper electrode. The fundamental mode in the transverse mode of the hollow laser beam canbe removed, and the beam quality is improved.

Description

technical field [0001] The invention relates to a semiconductor laser with Bragg reflectors distributed on an asymmetric ring structure and a vertical cavity surface emitting semiconductor laser. The high-resistance area is arranged eccentrically, which can remove the fundamental mode in the transverse mode of a hollow laser beam and improve the beam quality, and belongs to the technical field of semiconductor lasers. Background technique [0002] A Chinese invention patent with the patent number ZL201510113902.0 provides a technical solution named "Vertical Cavity Surface Emitting Semiconductor Laser with Distributed Bragg Reflectors on Ring Structure", such as figure 1 As shown, the vertical cavity surface-emitting semiconductor laser with distributed Bragg reflectors on the ring structure includes an upper electrode 1, an ohmic contact layer 2, an upper distributed Bragg reflector 3, an oxide confinement layer 4, and an active gain region from top to bottom. 5. The lower ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01S5/183H01S5/187
CPCH01S5/18347H01S5/18361H01S5/187
Inventor 晏长岭杨静航逄超冯源郝永芹张剑家
Owner CHANGCHUN UNIV OF SCI & TECH
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More