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Photoelectric detection cleaning platform for residual impurities of spinneret plate

A technology for residual impurities and photoelectric detection, which is applied in the direction of optical testing of flaws/defects, measuring devices, cleaning methods and tools, etc. It can solve problems such as inconvenient operation, low efficiency, and inability to locate and remove, so as to reduce the oscillation frequency and increase the oscillation frequency , the effect of improving the service life

Active Publication Date: 2020-05-15
DONGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a photoelectric detection and cleaning platform for residual impurities in spinnerets. The purpose is to solve the problem of inconvenient operation in the detection process of residual impurities in spinnerets, the inability to detect special-shaped holes, and the long time-consuming and low efficiency of the process of removing residual impurities in spinnerets in the prior art. And it is impossible to combine the detection results to achieve the problem of positioning and clearing

Method used

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  • Photoelectric detection cleaning platform for residual impurities of spinneret plate
  • Photoelectric detection cleaning platform for residual impurities of spinneret plate
  • Photoelectric detection cleaning platform for residual impurities of spinneret plate

Examples

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Embodiment 1

[0035] Such as figure 1 As shown, a spinneret residual impurity photoelectric detection and cleaning platform includes a transport device, a spinneret residual impurity detection device, a spinneret cleaning device and a processor;

[0036] The transport device is used to translate the spinneret from position A to position B. The transport device consists of a motor, a bracket 1, a transport belt 2 and a positioning block 7. The transport belt 2 is slidably connected to the support 1 and is driven by a motor. The transport belt 2 There is a through hole on the top, and a positioning block 7 is arranged in the through hole, the through hole is used to accommodate the spinneret, and the positioning block 7 is used to fix the spinneret;

[0037]Spinneret residual impurity detection device is used to form a light-tight space at position A. After the spinneret is placed at position A, the space is divided into upper and lower parts. The upper part is equipped with a light source 6,...

Embodiment 2

[0048] In this embodiment, the fan-shaped area of ​​the spinneret, the illumination sensor 9 , the position sensor 25 and the nozzle assembly 24 are all 12, and the rest are the same as in the first embodiment.

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Abstract

The invention relates to a photoelectric detection cleaning platform for residual impurities of a spinneret plate. The photoelectric detection cleaning platform comprises a transportation device, a spinneret plate residual impurity detection device, a spinneret plate cleaning device and a processor; the spinneret plate residual impurity detection device is used for forming a light-tight space at position A, the spinneret plate is arranged at the position A and then the space is divided into an upper part and a lower part, the upper part is provided with a light source, and the lower part is provided with N illuminance induction sensors and N position sensors; the spinneret plate cleaning device comprises a first flow storage device and N spray head assemblies, the N spray head assemblies are in communication with the first flow storage device and are located above a position B, the illumination induction sensors, the position sensors and the spray head assemblies are connected with theprocessor, and the processor is used for controlling the spray head assemblies corresponding to the corresponding area to work after determining the position of the area where the spinneret holes ofthe residual impurities are located by comparing an actual illuminance value with a theoretical illumination value. The platform is compact in structure and good in reliability, the detection and cleaning integration can be realized, the cleaning time is shortened, and the cleanliness of the spinneret plate is improved.

Description

technical field [0001] The invention belongs to the technical field of detection and cleaning of spinneret residual impurities, and relates to a photoelectric detection and cleaning platform of spinneret residual impurities. Background technique [0002] The spinneret is an indispensable and confidential part of the spinning equipment. Its function is to extrude the precisely metered viscous polymer melt or solution through the spinneret holes in the spinneret into a specific cross-section. The thin stream is solidified by side blowing or surrounding blowing to form filaments with a certain thickness. At the same time, because the diameter of the spinneret hole is too small (the diameter of the spinneret hole is as small as tens of microns, and as large as two to three hundred microns), In the process of the sudden transformation of the raw material from the high-temperature melting state to the low-temperature solidification state, residual impurities are likely to flow in ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B3/12B08B3/02B08B13/00F26B21/00G01N21/94G01B21/04
CPCB08B3/02B08B3/08B08B3/12B08B13/00F26B21/004G01B21/04G01N21/94
Inventor 甘学辉张东剑杨崇倡廖壑马晓建冯培王春雨
Owner DONGHUA UNIV