Photoelectric detection cleaning platform for residual impurities of spinneret plate
A technology for residual impurities and photoelectric detection, which is applied in the direction of optical testing of flaws/defects, measuring devices, cleaning methods and tools, etc. It can solve problems such as inconvenient operation, low efficiency, and inability to locate and remove, so as to reduce the oscillation frequency and increase the oscillation frequency , the effect of improving the service life
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Embodiment 1
[0035] Such as figure 1 As shown, a spinneret residual impurity photoelectric detection and cleaning platform includes a transport device, a spinneret residual impurity detection device, a spinneret cleaning device and a processor;
[0036] The transport device is used to translate the spinneret from position A to position B. The transport device consists of a motor, a bracket 1, a transport belt 2 and a positioning block 7. The transport belt 2 is slidably connected to the support 1 and is driven by a motor. The transport belt 2 There is a through hole on the top, and a positioning block 7 is arranged in the through hole, the through hole is used to accommodate the spinneret, and the positioning block 7 is used to fix the spinneret;
[0037]Spinneret residual impurity detection device is used to form a light-tight space at position A. After the spinneret is placed at position A, the space is divided into upper and lower parts. The upper part is equipped with a light source 6,...
Embodiment 2
[0048] In this embodiment, the fan-shaped area of the spinneret, the illumination sensor 9 , the position sensor 25 and the nozzle assembly 24 are all 12, and the rest are the same as in the first embodiment.
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