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Semiconductor process control method, device, equipment and readable storage medium

A control method and semiconductor technology, applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device testing/measurement, electrical components, etc., can solve problems such as inability to respond to changing production conditions, and achieve improved capacity, improved accuracy, and good production rate-boosting effect

Active Publication Date: 2022-05-17
CHANGXIN MEMORY TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, in the application of the semiconductor process, the weight setting of the EWMA used in the batch control technology is a fixed value determined based on the experience of the technicians, so it cannot cope with the rapidly changing production conditions, such as machine prevention. After Preventive Maintenance (PM) or replacement of key machine parts

Method used

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  • Semiconductor process control method, device, equipment and readable storage medium
  • Semiconductor process control method, device, equipment and readable storage medium
  • Semiconductor process control method, device, equipment and readable storage medium

Examples

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Embodiment Construction

[0041] Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete and fully convey the concept of example embodiments to those skilled in the art. The drawings are merely schematic illustrations of the invention and are not necessarily drawn to scale. The same reference numerals in the drawings denote the same or similar parts, and thus repeated descriptions thereof will be omitted.

[0042]Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the invention. However, those skilled in the art will appreciate ...

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Abstract

The present application discloses a semiconductor manufacturing process control method, device, equipment and readable storage medium. The control method includes: respectively acquiring a plurality of measurement values ​​of wafers selected in a plurality of historical reference periods in the semiconductor manufacturing process; and determining a weighting factor of the EWMA controller in batch control according to the plurality of measurement values ​​and target values ; Determine the recommended production parameter value of the current cycle according to the weighting factor; and feed back the suggested production parameter value of the current cycle to the semiconductor manufacturing process. The control method can improve the stability of the production suggestion parameters and improve the ability of the measured value to approach the target value.

Description

technical field [0001] The present invention relates to semiconductor process control technology, in particular, to a semiconductor process control method, device, equipment and readable storage medium based on batch control. Background technique [0002] Batch control (Run-to-run control or R2R control for short), also known as batch-to-batch control, is a type of feedback control. Run-to-Run (RtR, R2R) control is an optimized control method for batch processes. It updates the process model and adjusts the process plan based on the feedback evaluation and analysis of historical batch information, thereby reducing product differences between batches. . [0003] With the advancement of semiconductor manufacturing technology and the improvement of semiconductor product integration and manufacturing capacity, the semiconductor manufacturing process has become more and more complex, and the requirements for semiconductor manufacturing equipment and their control performance are...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/66H01L21/67
CPCH01L22/12H01L21/67276
Inventor 陈振豪
Owner CHANGXIN MEMORY TECH INC