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A kind of polarized multilayer film for 50-70nm vacuum ultraviolet band and preparation method thereof

A vacuum ultraviolet and multi-layer film technology, which is applied in the direction of polarizing elements, vacuum evaporation plating, coating, etc., can solve the problems of low flux of polarizing elements, achieve high polarization degree, low flux, and stable chemical properties Effect

Active Publication Date: 2022-02-15
苏州江泓电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polarizing multilayer film provided by the present invention can realize a high degree of polarization under the premise of relatively high reflectivity, and solve the problem of low flux of the existing polarizing element

Method used

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  • A kind of polarized multilayer film for 50-70nm vacuum ultraviolet band and preparation method thereof
  • A kind of polarized multilayer film for 50-70nm vacuum ultraviolet band and preparation method thereof
  • A kind of polarized multilayer film for 50-70nm vacuum ultraviolet band and preparation method thereof

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preparation example Construction

[0035] The present invention also provides a method for preparing the polarizing multilayer film described in the above technical solution, comprising the following steps:

[0036] On the surface of the substrate, the first SiC layer, the first Al layer, the first MgF 2 layer, second SiC layer, second Al layer, second MgF 2 layer, the third SiC layer, the third Al layer and the third MgF 2 Layer magnetron sputtering.

[0037] The present invention has no special limitation on the material of the substrate.

[0038] In the present invention, the background vacuum of the magnetron sputtering is preferably greater than 9E-5Pa; the working gas of the magnetron sputtering is preferably Ar, the flow rate of the Ar is preferably 20 sccm, and the pressure of the Ar is preferably 0.25Pa .

[0039] In the present invention, sputtering the first MgF 2 layer, the second MgF 2 layer and the third MgF 2 The method of layering is preferably radio frequency magnetron sputtering, the sp...

Embodiment 1

[0045] A polarizing multilayer film for the 50-70nm vacuum ultraviolet band, comprising a first SiC layer, a first Al layer, a first MgF 2 layer, second SiC layer, second Al layer, second MgF 2 layer, the third SiC layer, the third Al layer and the third MgF 2 layer, the light in the vacuum ultraviolet band of 50-70nm is incident at 45°, the thickness of the first SiC layer is 0.5nm, the thickness of the first Al layer is 0.5nm, and the first MgF 2 The thickness of the layer is 10nm, the thickness of the second SiC layer is 30nm, the thickness of the second Al layer is 20.93nm, the second MgF 2 The thickness of the layer is 0.5nm, the thickness of the third SiC layer is 20.26nm, the thickness of the third Al layer is 8.23nm, the third MgF 2 The thickness of the layer was 5.43 nm.

[0046] figure 1 R under the 45° incident angle of the polarizing multilayer film provided by Example 1 of the present invention S , R p And the relationship curve of P with wavelength, it can ...

Embodiment 2

[0073] A polarizing multilayer film for the 50-70nm vacuum ultraviolet band, comprising a first SiC layer, a first Al layer, a first MgF 2 layer, second SiC layer, second Al layer, second MgF 2 layer, the third SiC layer, the third Al layer and the third MgF 2 layer, the light in the vacuum ultraviolet band of 50-70nm is incident at 60°, the thickness of the first SiC layer is 10nm, the thickness of the first Al layer is 0.5nm, and the first MgF 2 The thickness of the layer is 0.5nm, the thickness of the second SiC layer is 30nm, the thickness of the second Al layer is 0.5nm, the second MgF 2 The thickness of the layer is 0.5nm, the thickness of the third SiC layer is 20nm, the thickness of the third Al layer is 15.49nm, the third MgF 2 The thickness of the layer was 7.19 nm.

[0074] The preparation method is the same as in Example 1.

[0075] Figure 6 R under the 60° incident angle of the polarizing multilayer film provided for Example 2 of the present invention S , R...

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Abstract

The invention provides a polarizing multilayer film used in the 50-70nm vacuum ultraviolet band and a preparation method thereof, belonging to the technical field of film preparation. The invention adopts the design idea of ​​"sub-quarter wavelength" and combines it with non-periodic multilayer film technology to realize a vacuum ultraviolet band of 50-70nm and a broadband polarized multilayer film with continuously adjustable energy. Transversely gradient multilayers and aperiodic multilayers are two methods to achieve wide passbands in extreme ultraviolet and soft X-ray bands. In the extreme ultraviolet and soft X-ray bands, the basis for the wideband tunability of laterally gradient multilayer films is that the optical constants of all materials are close to 1, so the physical period thickness of the multilayer film is approximately equal to its optical thickness, so when multiple When the physical thickness of the layer changes linearly in the direction of the transverse gradient, the linear change of the optical thickness in the direction of the transverse gradient is realized, and then the broadband can be adjusted, that is, the degree of polarization is improved under the premise of higher reflectivity.

Description

technical field [0001] The invention relates to the technical field of film preparation, in particular to a polarized multilayer film used in the vacuum ultraviolet band of 50-70nm and a preparation method thereof. Background technique [0002] The vacuum ultraviolet band is between the extreme ultraviolet band and the visible light band, and there are a large number of resonance lines of light elements in this band. In recent decades, with the rapid development of high-brightness synchrotron radiation sources, scientists are increasingly interested in the characterization of the optical properties of materials in this wavelength range. Polarization characteristics are one of the excellent characteristics of synchrotron radiation sources, and important information about materials can be obtained by measuring the changes in light intensity and polarization state caused by materials. In order to realize the quantitative measurement of polarization in the vacuum ultraviolet ba...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/30C23C14/35C23C14/18C23C14/06
CPCG02B5/3041C23C14/352C23C14/0635C23C14/0694C23C14/185
Inventor 朱杰金宇冀斌陈溢祺朱忆雪朱东风朱运平金长利
Owner 苏州江泓电子科技有限公司