Polarization multilayer film for vacuum ultraviolet band of 70-100nm and preparation method of polarization multilayer film

A vacuum ultraviolet, multi-layer film technology, applied in polarizing elements, vacuum evaporation coating, coating and other directions, can solve the problem of low flux of polarizing elements

Active Publication Date: 2020-07-07
苏州江泓电子科技有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polarizing multilayer film provided by the present invention can realize a high degree of polarization under the premise of relatively high reflectivity, and solve the problem of low flux of the existing polarizing element

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polarization multilayer film for vacuum ultraviolet band of 70-100nm and preparation method of polarization multilayer film
  • Polarization multilayer film for vacuum ultraviolet band of 70-100nm and preparation method of polarization multilayer film
  • Polarization multilayer film for vacuum ultraviolet band of 70-100nm and preparation method of polarization multilayer film

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0048] The present invention also provides a method for preparing the polarizing multilayer film described in the above technical solution, comprising the following steps:

[0049] On the surface of the substrate, the first Cr layer, the first Si layer, the first MgF 2 layer, the second Cr layer, the second Si layer, the second MgF 2 layer, the third Cr layer, the third Si layer and the third MgF 2 Layer magnetron sputtering.

[0050] The present invention has no special limitation on the material of the substrate.

[0051] In the present invention, the background vacuum of the magnetron sputtering is preferably greater than 9E-5Pa; the working gas of the magnetron sputtering is preferably Ar, the flow rate of the Ar is preferably 20 sccm, and the pressure of the Ar is preferably 0.25Pa .

[0052] In the present invention, sputtering the first MgF 2 layer, the second MgF 2 layer and the third MgF 2 The method of layering is radio frequency magnetron sputtering, the sput...

Embodiment 1

[0057] A polarizing multilayer film used in the vacuum ultraviolet band of 70-100nm, comprising a first Cr layer, a first Si layer, and a first MgF layer sequentially stacked on the surface of a substrate 2 layer, the second Cr layer, the second Si layer, the second MgF 2 layer, the third Cr layer, the third Si layer and the third MgF 2 layer, the wavelength of the vacuum ultraviolet band is 70-90nm, when the light of the vacuum ultraviolet band is incident at 45°, the thickness of the first Cr layer is 10nm, and the thickness of the first Si layer is 0.5nm, The first MgF 2 The thickness of the layer is 16.85nm, the thickness of the second Cr layer is 11.71nm, the thickness of the second Si layer is 10.18nm, the second MgF 2 The thickness of the layer is 7.31nm, the thickness of the third Cr layer is 1.09nm, the thickness of the third Si layer is 3.38nm, the third MgF 2 The thickness of the layer is 5 nm.

[0058] figure 1 R under the 45° incident angle of the polarizing ...

Embodiment 2

[0084] A polarizing multilayer film used in the vacuum ultraviolet band of 70-100nm, comprising a first Cr layer, a first Si layer, and a first MgF layer sequentially stacked on the surface of a substrate 2 layer, the second Cr layer, the second Si layer, the second MgF 2 layer, the third Cr layer, the third Si layer and the third MgF 2 layer, the wavelength of the vacuum ultraviolet band is 70-90nm, when the light of the vacuum ultraviolet band is incident at 60°, the thickness of the first Cr layer is 10nm, and the thickness of the first Si layer is 0.5nm, The first MgF 2 The thickness of the layer is 0.5nm, the thickness of the second Cr layer is 18.99nm, the thickness of the second Si layer is 29.83nm, the second MgF 2 The thickness of the layer is 6.86nm, the thickness of the third Cr layer is 0.5, the thickness of the third Si layer is 1.99nm, the third MgF 2 The thickness of the layer was 8.14 nm.

[0085] The preparation method is the same as in Example 1.

[0086...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a polarization multilayer film for a vacuum ultraviolet band of 70-100nm and a preparation method of the polarization multilayer film, and belongs to the technical field of filmpreparation. According to the invention, a sub-quarter wavelength design idea is combined with an aperiodic multilayer film technology to realize a broadband polarization multilayer film with a vacuum ultraviolet band of 70-100nm and continuously adjustable energy. A transverse gradient multilayer film and an aperiodic multilayer film are two methods for realizing wide passband in an extreme ultraviolet band range and a soft X-ray band range. In the extreme ultraviolet and soft X-ray wave bands, the basis for the transverse gradient multilayer film to realize broadband adjustability is that the optical constants of all the materials are close to 1. Therefore, the physical period thickness of the multilayer film is approximately equal to the optical thickness of the multilayer film, when the physical thickness of the multilayer film is linearly changed in the transverse gradient direction, the linear change of the optical thickness in the transverse gradient direction is realized, thebroadband adjustability is further realized, and the improvement of the polarization degree is realized on the premise of higher reflectivity.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a polarized multilayer film used in the vacuum ultraviolet band of 70-100 nm and a preparation method thereof. Background technique [0002] The vacuum ultraviolet band is between the extreme ultraviolet band and the visible light band, and there are a large number of resonance lines of light elements in this band. In recent decades, with the rapid development of high-brightness synchrotron radiation sources, people's research interest in the characterization of the optical properties of materials in this wavelength band has been increasing. Polarization characteristics are one of the excellent characteristics of synchrotron radiation sources, and important information about materials can be obtained by measuring the changes in light intensity and polarization state caused by materials. In order to realize the quantitative measurement of the polarization in the vac...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/30C23C14/35C23C14/18C23C14/06
CPCG02B5/3041C23C14/352C23C14/0635C23C14/0694C23C14/185
Inventor 朱杰陈溢祺金宇冀斌朱忆雪朱东风朱运平金长利
Owner 苏州江泓电子科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap