A polarizing multilayer film for 70-100nm vacuum ultraviolet band and its preparation method

A vacuum ultraviolet, multi-layer film technology, applied in polarizing elements, vacuum evaporation plating, coating, etc., can solve the problem of low flux of polarizing elements

Active Publication Date: 2022-04-08
苏州江泓电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polarizing multilayer film provided by the present invention can realize a high degree of polarization under the premise of relatively high reflectivity, and solve the problem of low flux of the existing polarizing element

Method used

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  • A polarizing multilayer film for 70-100nm vacuum ultraviolet band and its preparation method
  • A polarizing multilayer film for 70-100nm vacuum ultraviolet band and its preparation method
  • A polarizing multilayer film for 70-100nm vacuum ultraviolet band and its preparation method

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preparation example Construction

[0042] The present invention also provides the preparation method of the polarizing multilayer film described in the above technical scheme, comprising the following steps:

[0043] On the surface of the substrate, the first Si layer, the first Al layer, the first MgF 2 layer, second Si layer, second Al layer, second MgF 2 layer, the third Si layer, the third Al layer and the third MgF 2 Layer magnetron sputtering.

[0044] The present invention has no special limitation on the material of the substrate.

[0045]In the present invention, the background vacuum of the magnetron sputtering is preferably greater than 9E-5Pa; the working gas of the magnetron sputtering is preferably Ar, the flow rate of the Ar is preferably 20 sccm, and the pressure of the Ar is preferably 0.25Pa .

[0046] In the present invention, sputtering the first MgF 2 layer, the second MgF 2 layer and the third MgF 2 The method of layering is radio frequency magnetron sputtering, the sputtering power...

Embodiment 1

[0051] A polarizing multilayer film for the 70-100nm vacuum ultraviolet band, comprising a first Si layer, a first Al layer, and a first MgF layer stacked on the surface of a substrate in sequence 2 layer, second Si layer, second Al layer, second MgF 2 layer, the third Si layer, the third Al layer and the third MgF 2 layer, the wavelength of the vacuum ultraviolet band is 70-90nm, when the light of the vacuum ultraviolet band is incident at 45°, the thickness of the first Si layer is 15.4nm, and the thickness of the first Al layer is 2.48nm , the first MgF 2 The thickness of the layer is 2.48nm, the thickness of the second Si layer is 0.5nm, the thickness of the second Al layer is 5.44nm, the second MgF 2 layer thickness is 7.57nm, the thickness of the third Si layer is 4.7nm, the thickness of the third Al layer is 0.5nm, the third MgF 2 The thickness of the layer is 5 nm.

[0052] figure 1 R under the 45° incident angle of the polarizing multilayer film provided by Examp...

Embodiment 2

[0074] A polarizing multilayer film for the 70-100nm vacuum ultraviolet band, comprising a first Si layer, a first Al layer, and a first MgF layer stacked on the surface of a substrate in sequence 2 layer, second Si layer, second Al layer, second MgF 2 layer, the third Si layer, the third Al layer and the third MgF 2 layer, the wavelength of the vacuum ultraviolet band is 70-90nm, when the light of the vacuum ultraviolet band is incident at 60°, the thickness of the first Si layer is 20nm, and the thickness of the first Al layer is 2nm, so the first MgF 2 The thickness of the layer is 0.5nm, the thickness of the second Si layer is 30nm, the thickness of the second Al layer is 30nm, the second MgF 2 The thickness of the layer is 7.7nm, the thickness of the third Si layer is 1.8nm, the thickness of the third Al layer is 0.5nm, the third MgF 2 The thickness of the layer was 6.32 nm.

[0075] The preparation method is the same as in Example 1.

[0076] Figure 6 R under the ...

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Abstract

The invention provides a polarizing multilayer film used in the 70-100nm vacuum ultraviolet band and a preparation method thereof, belonging to the technical field of film preparation. The invention adopts the design idea of ​​"sub-quarter wavelength" and combines it with non-periodic multilayer film technology to realize a vacuum ultraviolet band of 70-100nm and a broadband polarized multilayer film with continuously adjustable energy. Transversely gradient multilayers and aperiodic multilayers are two methods to achieve wide passbands in extreme ultraviolet and soft X-ray bands. In the extreme ultraviolet and soft X-ray bands, the basis for the wideband tunability of transversely gradient multilayer films is that the optical constants of all materials are close to 1, so the physical period thickness of the multilayer film is approximately equal to its optical thickness, so when multiple When the physical thickness of the layer film changes linearly in the direction of the transverse gradient, the linear change of the optical thickness in the direction of the transverse gradient is realized, and then the broadband adjustment is realized, that is, the degree of polarization is improved under the premise of higher reflectivity.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a polarizing multilayer film for 70-100nm vacuum ultraviolet band and a preparation method thereof. Background technique [0002] The vacuum ultraviolet band is between the extreme ultraviolet band and the visible light band, and there are a large number of resonance lines of light elements in this band. In recent decades, with the rapid development of high-brightness synchrotron radiation sources, people's research interest in the characterization of the optical properties of materials in this wavelength band has been increasing. Polarization characteristics are one of the excellent characteristics of synchrotron radiation sources, and important information about materials can be obtained by measuring the changes in light intensity and polarization state caused by materials. In order to realize the quantitative measurement of the polarization in the vacuum ultravi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/30C23C14/35C23C14/18C23C14/06
CPCG02B5/3041C23C14/352C23C14/0635C23C14/0694C23C14/185
Inventor 朱杰朱忆雪金宇陈溢祺冀斌朱东风朱运平金长利
Owner 苏州江泓电子科技有限公司
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