Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

a polishing device

A polishing device and an integrated technology, applied in the direction of grinding drive device, grinding/polishing equipment, surface polishing machine tools, etc., can solve the problems of lack of processing flexibility, large labor force, short working schedule, etc., and achieve convenient coordination The effect of high degree of freedom in operation and operation and reduction of flexibility requirements

Active Publication Date: 2021-02-23
YIXING HOKKAI HEAD PLATE
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In industrial production, various workpieces need to be polished. Traditional polishing mainly uses manual polishing machines, which requires a lot of labor.
In the modern industrial processing process, polishing operations can be carried out by installing corresponding polishing devices on the industrial robot arms, but the existing industrial robot arms have limited flexibility and short working strokes. The degree of freedom is low and the flexibility of processing is lacking. As a result, the same production line can only process workpieces of specific sizes and shapes. When changing product types, it is necessary to significantly modify the processing stations of the robots and polishing devices on the production line. Increased difficulty and cost of production line modification

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • a polishing device
  • a polishing device
  • a polishing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the technical solutions in the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0022] see Figure 1 to Figure 4 , the present invention provides a technical solution: a polishing device, including a connecting seat 3 installed on the robot arm 1 through a fixing screw 18, and the end of the robot arm 1 is integrally formed with a rotating docking seat 25 installed with the main body of the robot through a bearing , the first adjustment push rod 2 is fixedly installed on the connecting seat 3 through bolts, and the output end of t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of mechanical processing, in particular to a polishing device for polishing a robot arm, comprising a connecting seat installed on the robot arm through a fixing screw, and the end of the robot arm is integrally formed with a connecting seat installed with the robot main body through a bearing. The docking seat is rotated, and the connecting seat is fixed with a first adjustment push rod by bolts. The beneficial effect is: the polishing device can be well and quickly installed on the end of the robot arm, and the device itself has a high degree of freedom of operation, good operational flexibility, and is convenient for collaborative operation with various industrial robots, reducing the difficulty of production line transformation. The polishing device has high processing flexibility, can adapt to the processing needs of workpieces of different sizes and shapes by writing corresponding control programs, and at the same time quickly realize the conversion of processing stations, thereby effectively reducing the number of workpiece clamping and turning .

Description

technical field [0001] The invention relates to the technical field of machining, in particular to a polishing device for a robot arm. Background technique [0002] In industrial production, various workpieces need to be polished. The traditional polishing process mainly uses a manually operated polishing machine, which requires a lot of labor. In the modern industrial processing process, polishing operations can be carried out by installing corresponding polishing devices on the industrial robot arms, but the existing industrial robot arms have limited flexibility and short working strokes. The degree of freedom is low and the flexibility of processing is lacking. As a result, the same production line can only process workpieces of specific sizes and shapes. When changing product types, it is necessary to significantly modify the processing stations of the robots and polishing devices on the production line. Increased the difficulty and cost of production line modification...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B24B29/00B24B41/02B24B47/12B24B47/22B24B47/20B25J18/00B25J11/00
CPCB24B29/00B24B41/02B24B47/12B24B47/20B24B47/22B25J11/0065B25J18/00
Inventor 杨仕枚其他发明人请求不公开姓名
Owner YIXING HOKKAI HEAD PLATE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com