Broken wiring repair process
A wiring and process technology, applied in the field of wiring disconnection repair process, can solve the problems of no contact with the metal layer of the substrate, failure of disconnection repair, excessive damage, etc., and achieve the effect of good conductivity and ideal filling effect.
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[0027] Such as image 3 As shown, the embodiment of the present invention provides a wiring disconnection repair process, including:
[0028] Based on the vapor deposition method, in the damage gap 1 caused by excessive laser damage on the metal layers on both sides of the Zap Hole (repair hole) in the substrate, a tungsten conductive film for connecting the metal layer of the substrate is selectively formed, and the tungsten Conduct EHD-silver ink wiring on the conductive film.
[0029] Specifically, a nanoscale cutting laser is first selected, and a cutting laser is emitted on the insulating layer at the top of the broken line of the substrate to make a Zap Hole, so that the two sides of the Zap Hole include the Metal2 insulating layer 2 and the Metal2 metal layer 3 exposed from the top to the bottom in sequence. (Al+Co) and G.IN insulation layer 4, wherein the nanoscale cutting laser is the nanoscale cutting laser that comes with LCVD laser repair, and the cutting laser fo...
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