Double-buffering type photoresist liquid spraying system

A double-buffering and photoresist technology, applied in liquid injection devices, injection devices, filtration and separation, etc., can solve the problems of affecting the coating effect, time-consuming, and generating bubbles

Active Publication Date: 2020-07-28
芯米(厦门)半导体设备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, during the pre-wetting process of the filter, air bubbles will be generated due to the influence of speed, pressure or temperature
If the coating operation is carried out directly, the coating effec

Method used

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  • Double-buffering type photoresist liquid spraying system

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Embodiment Construction

[0022] During the photoresist coating process, there will be phenomena such as poor coverage and poor flatness. One of the reasons for these phenomena is that air bubbles remain inside the photoresist during the filter pre-wetting process, making the photoresist not Continuous coating on chip (wafer) surface. However, to avoid the above-mentioned reasons, photoresist fluid is usually wasted, and photoresist fluid is an expensive material.

[0023] Therefore, the present invention provides a double-buffer photoresist liquid spraying system to solve the above-mentioned shortcomings. For a clearer representation, the present invention will be described in detail below in conjunction with the accompanying drawings.

[0024] The embodiment of the present invention provides a double-buffer photoresist spraying system, please refer to figure 1 , the system includes:

[0025] The first liquid storage tank 100 is used to store and supply photoresist liquid (photoresist liquid figur...

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Abstract

The invention discloses a double-buffering type photoresist liquid spraying system. The spraying system is characterized by comprising a first liquid storage tank, a first filter, a first buffer, a second liquid storage tank, a second filter and a second buffer, wherein the first filter is arranged between the first liquid storage tank and the first buffer, the first buffer is connected with a first pumpback pipe, the first pumpback pipe is provided with a first pumpback pump, the second filter is arranged between the second liquid storage tank and the second buffer, the second buffer is connected with a second pumpback pipe, the second pumpback pipe is provided with a second pumpback pump; and the spraying system further comprises one of the two structures, the first structure comprises aselection mechanism and a total photoresist liquid pump, and the second structure comprises a selection mechanism, a first photoresist liquid pump and a second photoresist liquid pump. According to the double-buffering type photoresist liquid spraying system, photoresist liquid can be better saved, and it is guaranteed that photoresist liquid supply is not stopped.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a double-buffer photoresist liquid spraying system. Background technique [0002] Photoresist coating (Coating) plays a very important role in the field of semiconductor manufacturing. For example, in the etching process, the photoresist layer is used as a mask for the etched film to keep the desired pattern from being removed by the etching reaction. Another example is in the ion implantation (ion implantation) process, the photoresist layer also has the function of a mask, so that doping is only doped into a predetermined area. [0003] The photoresist liquid spraying system mainly includes structures such as a first liquid storage tank, a first buffer, a first photoresist liquid pump, a filter, a control valve, and a nozzle. The photoresist liquid supplied from the first liquid storage tank first enters the first buffer, and then the photoresist liquid in the first...

Claims

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Application Information

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IPC IPC(8): B05B15/40B05B9/04B05B12/14B01D35/12
CPCB05B15/40B05B9/0403B05B12/14B01D35/12B05B9/0406
Inventor 尹安和
Owner 芯米(厦门)半导体设备有限公司
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