Double-buffering type photoresist liquid spraying system

Abstract

The invention discloses a double-buffering type photoresist liquid spraying system. The spraying system is characterized by comprising a first liquid storage tank, a first filter, a first buffer, a second liquid storage tank, a second filter and a second buffer, wherein the first filter is arranged between the first liquid storage tank and the first buffer, the first buffer is connected with a first pumpback pipe, the first pumpback pipe is provided with a first pumpback pump, the second filter is arranged between the second liquid storage tank and the second buffer, the second buffer is connected with a second pumpback pipe, the second pumpback pipe is provided with a second pumpback pump; and the spraying system further comprises one of the two structures, the first structure comprises aselection mechanism and a total photoresist liquid pump, and the second structure comprises a selection mechanism, a first photoresist liquid pump and a second photoresist liquid pump. According to the double-buffering type photoresist liquid spraying system, photoresist liquid can be better saved, and it is guaranteed that photoresist liquid supply is not stopped.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a double-buffer photoresist liquid spraying system. Background technique [0002] Photoresist coating (Coating) plays a very important role in the field of semiconductor manufacturing. For example, in the etching process, the photoresist layer is used as a mask for the etched film to keep the desired pattern from being removed by the etching reaction. Another example is in the ion implantation (ion implantation) process, the photoresist layer also has the function of a mask, so that doping is only doped into a predetermined area. [0003] The photoresist liquid spraying system mainly includes structures such as a first liquid storage tank, a first buffer, a first photoresist liquid pump, a filter, a control valve, and a nozzle. The photoresist liquid supplied from the first liquid storage tank first enters the first buffer, and then the photoresist liquid in the first...

AI Technical Summary

Problems solved by technology

[0007] However, during the pre-wetting process of the filter, air bubbles will be generated due to the influence of speed, pressure or temperature

If the coating operation is carried out directly, the coating effect will be affected

If the exhaust operation is performed after pre-wetting, it will take more time and increase the cost of photoresist fluid, making filter replacement a time-consuming and cost-intensive procedure

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