Combustion treatment device for semiconductor process waste gas
A processing device and semiconductor technology, which is applied in the field of semiconductors, can solve the problems of uneven combustion temperature of exhaust gas and insufficient combustion, and achieve the effect of sufficient combustion and uniform exhaust gas
Inactive Publication Date: 2020-08-18
邓筑蓉
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Problems solved by technology
[0003] The existing semiconductor process exhaust gas combustion treatment device preheats the incoming exhaust gas by setting up a ceramic heat transfer plate in the combustion box to make it burn more fully. When passing through the ceramic heat transfer plate, the heat of the upper exhaust gas is lower than that of the ceramic heat transfer plate. The heat of the exhaust gas directly contacted by the heat transfer plate, the combustion temperature of the exhaust gas at different heights in the combustion box is not uniform during subsequent combustion, so that it cannot be fully burned
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Embodiment 1
[0028] see Figure 1-Figure 7 , the present invention provides a combustion treatment device for semiconductor process waste gas, its structure includes a guide pipe 1, an upper fixed plate 2, a combustion chamber 3, a fixed seat 4, and a delivery pipe 5, and the guide pipe 1 is installed on the upper fixed plate 2 , and run through the upper fixed plate 2 to connect with the combustion chamber 3, the combustion chamber 3 is located on the fixed seat 4, the fixed seat 4 is provided with a conveying pipeline 5, and the conveying pipeline 5 communicates with the combustion chamber 3;
[0029] The combustion chamber 3 is composed of a connecting pipe a, an air mixing device b, an extension wall c, an upper port d, a drum e, a central rod f, a mixing chamber g, and an oxygen inlet pipe h, and the connecting pipe a communicates with the mixing chamber g , the connecting pipe a is connected to the conveying pipeline 5, the mixing chamber g is provided with an air mixing device b, an...
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The invention discloses a combustion treatment device for semiconductor process waste gas. The treatment device structurally comprises a guiding pipeline, an upper fixing plate, a combustion bin, a fixing seat and a conveying pipeline; the guiding pipeline is arranged on the upper fixing plate and penetrates through the upper fixing plate to be connected with the combustion bin; the combustion binis arranged on the fixing seat; and the conveying pipeline is arranged on the fixing seat, and the conveying pipeline communicates with the combustion bin. The treatment device has the beneficial effects that a gas mixing device is arranged in the combustion bin, so that when the waste gas is combusted, a rod shaft rotates to drive a ring rod to rotate and act on a sub-ring of a moving ring, thering rod can be embedded into the moving ring in the rotating process and can accurately push the moving ring to move, and furthermore, by means of vertical plates and stirring balls arranged in hollowed-out shapes, the waste gas in combustion is uniform, and then the purpose of sufficient combustion is achieved.
Description
technical field [0001] The invention relates to the field of semiconductors, in particular to a combustion treatment device for semiconductor process waste gas. Background technique [0002] Semiconductor process production can not only meet the production requirements of the process, but also take into account industrial safety. At the same time, it can contribute to environmental protection. However, the waste gas produced by the semiconductor process has certain hazards and will cause environmental pollution. Therefore, it needs to be treated. The current The combustion treatment device for semiconductor process waste gas has the following defects: [0003] The existing semiconductor process waste gas combustion treatment device preheats the incoming waste gas by setting up a ceramic heat transfer plate in the combustion box to make it burn more fully. When passing through the ceramic heat transfer plate, the heat of the upper exhaust gas is lower than that of the ceramic...
Claims
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Patent Timeline
Login to View More IPC IPC(8): F23G7/06F23G5/32F23G5/44
CPCF23G5/32F23G5/44F23G7/06F23G2209/14
Inventor 邓筑蓉
Owner 邓筑蓉