Unlock instant, AI-driven research and patent intelligence for your innovation.

Paired graph insertion method, device and storage medium

A technology for graphic insertion and insertion direction, applied in character and pattern recognition, computer-aided design, special data processing applications, etc., can solve the problems of high error rate and low efficiency, and achieve the effect of reducing error rate and improving insertion efficiency

Active Publication Date: 2020-08-21
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present application provides a paired graphics insertion method, device and storage medium, which can solve the problems of low efficiency and high error rate caused by manually inserting graphics into an integrated circuit layout in the related art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Paired graph insertion method, device and storage medium
  • Paired graph insertion method, device and storage medium
  • Paired graph insertion method, device and storage medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0050] The technical solutions in this application will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0051]In the description of this application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, use a specific orientatio...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a paired graph insertion method, a device and a storage medium. The paired graph insertion method comprises the steps: inserting a first paired graph into an integrated circuitlayout; along the insertion direction, inserting a second paired graph at a position which is a preset distance away from the first paired graph, the second paired graph being a graph matched with the first paired graph in shape; and when any paired graph in the first paired graph and the second paired graph does not meet the paired graph insertion standard, moving the first paired graph and thesecond paired graph along the moving direction until the first paired graph and the second paired graph meet the paired graph insertion standard. According to the invention, the first paired graph andthe second paired graph which are matched with each other in shape are inserted into the integrated circuit layout; the first paired graph and the second paired graph are moved to meet the paired graph standard, and on the basis that the paired graphs are automatically inserted into the integrated circuit layout, the insertion error probability of the paired graphs is reduced.

Description

technical field [0001] The present application relates to the technical field of integrated circuit manufacturing, in particular to a method, device and storage medium for inserting paired graphics in integrated circuit layout design. Background technique [0002] refer to figure 1 , which shows a schematic diagram of a rotation pattern in an integrated circuit layout. Such as figure 1 As shown, a pairing figure 121 is set on the exposure unit (shot) 111, and a pairing figure 122 is set on the exposure unit 112, wherein the pairing figure 121 and the pairing figure 122 are a figure pair that can be merged into a complete image. When it is determined that the paired pattern 121 and the paired pattern 122 can be stitched together, it can be determined that the exposure of the exposure unit 111 and the exposure unit 112 is accurate. [0003] In the related art, the matching pattern is usually manually inserted into the exposure unit, which has low efficiency and high error r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/392G06K9/62
CPCG06F30/392G06F18/22
Inventor 张兴洲
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP