Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Metal mask

A metal mask and mask technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of inability to support the metal mask and increase the size of the metal mask with special-shaped support bars Drooping and other problems can be achieved to achieve high-precision netting, avoid poor precision of netting, and ensure accuracy

Pending Publication Date: 2020-10-09
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a metal mask, which can solve the problem that the special-shaped support bars in the prior art mainly produce tensile deformation in the Y direction after stretching the net, and increase the sagging of the special-shaped support bars and the metal mask plate, which cannot provide support Technical issues on the effect of metal masks

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metal mask
  • Metal mask
  • Metal mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figure, units with similar structures are indicated by the same reference numerals, and the dotted lines in the figure indicate that they do not exist in the structure, and only illustrate the shape and position of the structure.

[0029] The present invention aims at the special-shaped support bar in the prior art, after stretching the net, mainly produces tensile deformation in the Y direction, increases the sag of the special-shaped support bar and t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a metal mask. A special-shaped shielding strip of the metal mask comprises a main body, a special-shaped protruding block which is arranged on one side of the main body and a straight edge which is arranged on the other side of the main body and opposite to the special-shaped protruding block; and the straight edge is provided with a protrusion which has a reverse stretchingeffect with the special-shaped protruding block relative to the main body, welding areas are arranged at the two ends of the main body respectively, and smooth structure transition is adopted betweenthe special-shaped protruding block and the welding areas. According to the metal mask, when the metal mask is subjected to tension welding, due to the fact that the special-shaped protruding block and the smooth transition structure are adopted on the main body, the sudden change amount generated by welding is effectively reduced, the stability of the metal mask in the Y direction is improved, the situation that the tension precision is poor due to the fact that the Y-direction structure of a special-shaped supporting strip is asymmetric is avoided, and therefore, high-precision tension of the metal mask is realized, and the accuracy of film coating is ensured.

Description

technical field [0001] The invention relates to the technical field of display panel manufacturing, in particular to a metal mask plate. Background technique [0002] Full-screen mobile phones are the development trend of the mobile phone industry in the future, and there are many ways to achieve full-screen at present. Currently, the mainstream full-screen mobile phone types on the market include notch screens and water drop screens. In order to increase the screen-to-body ratio of mobile phones as much as possible, the Components such as earpieces and cameras are placed in non-display areas such as bangs and water droplets, and small-sized special-shaped blind holes or through holes require fine mask plates to prepare. [0003] In the evaporation process of the existing OLED device, a fine metal mask (Fine Metal Mask, referred to as FMM) is used. The mask includes a special-shaped support bar (Howling) and a conventional shielding part ( Cover Mask), the special-shaped su...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/04C23C14/12C23C14/24H01L51/56
CPCC23C14/042C23C14/12C23C14/24H10K71/166H10K71/00
Inventor 唐振戴万里李玉鑫王衣可
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com