Preservative-free moisturizing mask liquid and preparation method thereof

A preservative and wet face technology, applied in the field of daily chemicals, can solve the problems of poor moisturizing effect and containing preservatives, and achieve the effects of reducing water loss, less skin irritation and soothing effect

Active Publication Date: 2020-10-13
GUANGZHOU KENENG COSMETICS RES CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a moisturizing facial mask liquid without preservatives, which solves the defects of poor moisturizing effect of existing facial mask liquids and containing preservatives

Method used

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  • Preservative-free moisturizing mask liquid and preparation method thereof
  • Preservative-free moisturizing mask liquid and preparation method thereof
  • Preservative-free moisturizing mask liquid and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0077] The preservative-free moisturizing mask liquid of the present embodiment comprises the following ingredients by mass percentage:

[0078] The cosmetic formula of table 1, embodiment 1

[0079]

[0080]

[0081] Preparation:

[0082] (1) Add disodium EDTA, glycerin, acrylic acid (ester) / C10-30 alkanol acrylate crosslinked polymer, hydrolyzed sclerotin, allantoin to deionized water, stir and heat to 80°C for 20 Minutes, to get the mixture A;

[0083] (2) dissolving butanediol, hexanediol, and p-hydroxyacetophenone at 70°C and mixing them uniformly to obtain a mixed solution B;

[0084] (3) Stir the mixed solution A obtained in step (1) at room temperature to cool down to 70° C., add the mixed solution and aminomethyl propanol and homogenize for 3 minutes to obtain mixed solution C;

[0085] (4) After the mixed solution C is cooled to room temperature, add purslane extract, leuconostococcus / radish root fermentation product filtrate, glycerol glucoside, polyglutami...

Embodiment 2

[0087] The preservative-free moisturizing mask liquid of the present embodiment comprises the following ingredients by mass percentage:

[0088] The cosmetic formula of table 2, embodiment 2

[0089] Element add ratio Glycerol Glucoside 2.3％ Water Soluble Ceramide 0.5％ polyglutamic acid 0.25％ Lactobacillus / Soybean Extract Ferment Filtrate 1.5％ Disodium EDTA 0.02％ Purslane Extract 2％ glycerin 2％ Butanediol 5％ Hexylene glycol 0.5％ Hydrolyzed Sclerotinia 0.12％ Acrylates / C10-30 Alkyl Acrylate Crosspolymer 0.14％ Allantoin 0.1％ Aminomethylpropanol 0.08％ p-Hydroxyacetophenone 0.5％ Leuconostoc / radish root ferment filtrate 2.5％ Deionized water Balance to 100%

[0090] Preparation:

[0091] (1) Add disodium EDTA, glycerin, acrylic acid (ester) / C10-30 alkanol acrylate crosslinked polymer, hydrolyzed sclerotin, and allantoin to deionized water, stir and heat to 85°C for 15 Minu...

Embodiment 3

[0096] The preservative-free moisturizing mask liquid of the present embodiment comprises the following ingredients by mass percentage:

[0097] The cosmetic formula of table 3, embodiment 3

[0098] Element add ratio Glycerol Glucoside 4.2％ Water Soluble Ceramide 0.8％ polyglutamic acid 0.5％ Lactobacillus / Soybean Extract Ferment Filtrate 2.3％ Disodium EDTA 0.02％ Purslane Extract 2％ glycerin 2％ Butanediol 5％ Hexylene glycol 0.5％ Hydrolyzed Sclerotinia 0.12％ Acrylates / C10-30 Alkyl Acrylate Crosspolymer 0.14％ Allantoin 0.1％ Aminomethylpropanol 0.08％ p-Hydroxyacetophenone 0.5％ Leuconostoc / radish root ferment filtrate 2.5％ Deionized water Balance to 100%

[0099] Preparation:

[0100] (1) Add disodium EDTA, glycerin, acrylic acid (ester) / C10-30 alkanol acrylate crosslinked polymer, hydrolyzed sclerotin, and allantoin to deionized water, stir and heat to 85°C for 15 Minut...

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PUM

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Abstract

The invention discloses a preservative-free moisturizing mask liquid and a preparation method thereof. The moisturizing mask liquid comprises the following components: 0.01-5% of glycosylglycerol, 0.01-2% of water-soluble ceramide, 0.001-1% of polyglutamic acid, 0.1-8% of lactobacillus/soybean extract fermentation product filtrate, 0.01-0.05% of a chelating agent, 0.01-5% of an allergy-relieving agent, 1-15% of polyhydric alcohol, 0.01-1% of a thickening agent, 0.1-11% of a skin conditioner, 0.01-1% of a pH regulator, 0.01-1% of p-hydroxyacetophenone, 0.5-5% of leuconostoc/radish root fermentation product filtrate and the balance of deionized water. Through collocation of the glycosylglycerol, the water-soluble ceramide, the polyglutamic acid and the lactobacillus/soybean extract fermentation product filtrate, the moisturizing mask liquid disclosed by the invention has a synergistic effect, and the soothing and anti-allergic effects of the mask liquid are improved through coordinationwith the allergy-relieving agent, so that the mask liquid has relatively good moisturizing and soothing effects, does not contain a chemical preservative at the same time and can effectively reduce the irritation thereof. The preparation method of the moisturizing mask liquid is simple in operation, high in production efficiency and low in production cost, and can be applied to large-scale production.

Description

technical field [0001] The invention relates to the field of daily chemicals, in particular to a preservative-free moisturizing mask liquid and a preparation method thereof. Background technique [0002] With the improvement of people's living standards, people's demand for beauty is getting higher and higher, and the most important process of beauty treatment is to moisturize and replenish water. Dehydration of the skin can cause many skin problems. When the skin lacks water, it will cause the cuticle to fall off, causing symptoms such as dead skin and desquamation; the skin is in a state of water shortage or intermittent water shortage for a long time, which will cause symptoms such as slight itching or dryness of the skin; the most obvious skin dehydration The symptom is that the whole face feels tight, especially the cheeks, etc., and even small wrinkles and dry skin may appear locally. [0003] At present, facial masks have become a necessity for the daily maintenance...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/99A61K8/9789A61K8/88A61K8/68A61K8/60A61Q19/00A61P37/08
CPCA61K8/99A61K8/9789A61K8/88A61K8/68A61K8/602A61Q19/00A61P37/08A61K2800/30A61K2800/72A61K2800/592
Inventor 张慧林娜妹张金金李传茂张伟杰张楚标曾伟丹
Owner GUANGZHOU KENENG COSMETICS RES CO LTD
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