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Resist stripping liquid composition, panel display substrate and manufacturing method thereof

A technology of stripping liquid and composition, which is applied in the direction of equipment, photoplate making process of patterned surface, optics, etc., can solve the problems such as the reduction of stripping property, and achieve the effects of improving volatilization loss, preventing the occurrence of excellent streaks, and excellent anti-corrosion ability Effect

Pending Publication Date: 2020-10-16
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] The object of the present invention is to provide a resist stripping liquid composition which has excellent anticorrosion ability and anti-spotting effect, and improves stripping properties caused by amine volatilization loss under long-term storage and high-temperature process temperature conditions Lowering the problem

Method used

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  • Resist stripping liquid composition, panel display substrate and manufacturing method thereof
  • Resist stripping liquid composition, panel display substrate and manufacturing method thereof
  • Resist stripping liquid composition, panel display substrate and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～6 and comparative example 1～7

[0062] Examples 1-6 and Comparative Examples 1-7: Manufacture of resist stripping liquid composition

[0063] The components and contents described in the following Table 1 were mixed to prepare a resist stripping liquid composition.

[0064] [Table 1]

[0065]

[0066] A-1: 2-(2-(Hydroxymethylamino)ethoxy)ethanol

[0067] A-2: Ethylaminomethanol

[0068] A-3: N-(2-hydroxypropyl) aminomethanol

[0069] A-4: 2-Hydroxymethylaminoethanol

[0070] A-5: Diethanolamine

[0071] A-6: Monoethanolamine

[0072] A-7: Methylaminomethanol

[0073] A-8: N-Methylolacetamide

[0074] B-1: N-Methylpyrrolidone

[0075] B-2: N-ethylformamide

[0076] B-3: Dimethylsulfoxide

[0077] E-1: 4-Hydroxymethyl-1,3-dioxolane

[0078] E-2: Diethylene glycol monomethyl ether

[0079] E-3: Diethylene glycol monoethyl ether

[0080] D-1: 4-methyl-4,5,6,7-tetrahydro-1H-benzo[1,2,3]triazole

[0081] D-2: Tolyltriazole

experiment example 1

[0082] Evaluation of peeling ability of cleaning solution

[0083] In order to confirm the stripping effect of the photoresist cleaning compositions of the above-mentioned examples and comparative examples, a photoresist was uniformly coated on a 10*10cm glass with a film thickness of 1.2 μm by a spin coater, and then heated at 150° C. Implement the 10min baking process, cut into 2*2cm, and prepare the substrate. After maintaining the temperature at 50 degreeC constant about the composition for resist cleaning, the target object was immersed by dividing the immersion time, and peeling ability was evaluated. Thereafter, in order to remove the cleaning solution remaining on the substrate, cleaning was performed with pure water for 1 minute, and in order to remove the pure water remaining on the substrate after cleaning, the substrate was completely dried with nitrogen gas. The modified or cured resist and dry etching residue removal performance of the above-mentioned substrate...

experiment example 2

[0084] Evaluation of the peeling ability of the cleaning solution over time

[0085]The prepared experimental reagent was left at room temperature for one week, and then the peeling ability of the cleaning solutions of the above-mentioned examples and comparative examples was evaluated by the same method as in the experiment of . The results are shown in Table 2 below.

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Abstract

The present invention relates to a resist stripping liquid composition comprising (a) a secondary amine represented by Chemical Formula 1, (b) an aprotic organic solvent compound, and (c) a primary alcohol compound, a method for manufacturing a panel display substrate, which comprises a step for cleaning a panel display substrate using the resist stripping liquid composition; and a panel display substrate manufactured by the manufacturing method. In chemical formula 1, R is a C2-C20 linear or branched alkyl group, a C5-C8 cycloalkyl group, or the like.

Description

[0001] This application is a divisional application of a Chinese patent application with an application date of August 31, 2016, an application number of 201610798259.4, and an invention title of "Resist stripping solution composition, flat panel display substrate and manufacturing method thereof". technical field [0002] The present invention relates to a resist stripping liquid composition, a flat panel display substrate manufacturing method using the same, and a flat panel display substrate. Background technique [0003] In recent years, as demands for realizing high resolution of flat panel display devices have increased, efforts to increase the number of pixels per unit area have been made. Under such a trend, reduction of the wiring width is also required, and in order to cope with this trend, a dry etching process and the like have been introduced, and the process conditions have become increasingly severe. [0004] In addition, since the signal speed in wiring is al...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/426
Inventor 李喻珍高京俊金圣植金正铉崔汉永
Owner DONGWOO FINE CHEM CO LTD