Water-cooled ion delivery pipe of ion implanter

Abstract

The invention discloses a water-cooled ion delivery pipe of an ion implanter. The water-cooled ion delivery pipe comprises an outer pipe, an inner pipe and two pipe joints, wherein the outer pipe comprises an integrally formed first arc-shaped pipe and two first straight pipes respectively arranged at two ends of the first arc-shaped pipe, the inner pipe comprises an integrally-formed second arc-shaped pipe and two second straight pipes arranged at two ends of the second arc-shaped pipe respectively, a first inserting hole, a middle hole, a second inserting hole and a through hole are formed in the pipe connector, diameters of the first inserting hole, the middle hole, the second inserting hole and the through hole are sequentially reduced, the first straight pipe is inserted and fixed inthe first insertion hole, the second straight pipe is inserted and fixed in the second insertion hole, and two ends of a cooling cavity formed by the outer pipe and the inner pipe are respectively communicated with middle holes of the two pipe joints. The water-cooled ion delivery pipe is advantaged in that the conveying pipe is divided into an inner pipe body and an outer pipe body, the inner pipe body is cooled through the cooling cavity formed between the inner pipe body and the outer pipe body, the service life of the conveying pipe can be effectively prolonged, and influences on other machine parts are reduced.

Description

technical field [0001] The invention relates to the technical field of semiconductor production, in particular to a water-cooled ion delivery tube of an ion implanter. Background technique [0002] In the semiconductor production process, the mainstream impurity doping technology adopts ion implantation technology, and ion implantation machine is generally used to realize ion implantation technology. This method is to generate plasma by the ion source, and then extract the required ion components through mass spectrometry, accelerate the ion to form an ion beam with a certain speed, and inject it into the semiconductor substrate, so the ion implanter is a semiconductor It is a very commonly used equipment in the production process. The mass analyzer is the core component of the ion implanter. It is an instrument that separates the sample ions generated in the ion source according to the mass-to-charge ratio in different ways, and can separate the required impurity ions from...

AI Technical Summary

Problems solved by technology

Between the ion source and the mass analyzer, that is, the front end of the mass analyzer is connected with a pipeline for transmitting the ion beam, wherein the pipeline between the single-focus mass analyzer and the ion source is an arc-shaped pipeline with a certain radius. The tube is impacted by high-temperature and high-speed ion beams for a long time, so that the temperature of the delivery tube is in a high temperature state for a long time, which not only affects the service life of the delivery tube, but also affects the normal operation of other parts of the ion implanter

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