Projection objective lens wave aberration detection device and detection method for improving detection speed
A technology of projection objective lens and detection device, which is applied in the direction of exposure device of photographic process, photography, photographic process of patterned surface, etc., can solve the problems of grating processing accuracy, difficulty in sinusoidal grating processing, high processing cost, etc., and achieve improved detection Speed and accuracy, reduce processing cost, reduce the effect of processing difficulty
Active Publication Date: 2021-07-27
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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However, the processing of sinusoidal gratings is more difficult and the cost is higher; while the period of the image plane grating is small, the processing cost of the two-dimensional amplitude-phase mixed grating will also be high, and the processing accuracy of the grating will also be affected to a certain extent
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[0037] For a better understanding, technical solutions, and advantages, the present invention will be made in conjunction with the accompanying drawings and examples, but the scope of the invention should not be limited.
[0038] figure 1 A schematic diagram of the projecting objective wave aberration detecting device of the present invention, which is visible, the projecting objective wave aberration detecting device of the present invention includes a light source and a lighting system 1, an object surface grating 2, an object surface shift station 3, and is tested to an investural objective mirror 4, Like surface grating 5, two dimensional optoelectronic sensor 6, image surface shift station 7, and control processing unit 8; said light source and illumination system 1 output space non-coherent light, said object surface grating 2 is located in a photographed objective mirror 4 In the field of view, the light source and the lighting system 1 are uniformly illuminated, and the l...
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A projection objective lens wave aberration detection device and detection method, the projection objective lens wave aberration detection device includes a light source and an illumination system, an object plane grating, an object plane displacement platform, a projected projection objective lens, an image plane grating, a two-dimensional photoelectric sensor, Image plane stage and control processing unit. The present invention adopts the amplitude-phase hybrid grating whose period is doubled by the object plane grating to suppress other diffraction orders other than the ±1 order diffraction order, and the image plane grating can adopt a checkerboard grating, which reduces the system cost and improves the wave aberration Inspection speed and accuracy.
Description
Technical field [0001] The present invention relates to optical measurements, and in the field of photolithography, in particular, a projection objective wave aberration detecting device and detection method for improving detection speed. Background technique [0002] The RONCHI grating shear interferometer has a common circuit, there is no space light path, does not require a separate ideal reference wavefront, high precision, high sensitivity, simple structure, and other advantages such as measurement of optical system wave abrasions. Especially for high-end projection photolithography, the shear interferometer is one of the main technical solutions of the projection objective wave image and offline detection of high-end projection photolithography. [0003] Unlike the interference between the ordinary two beam light, in the interference station of the Ronchi shear interferometer, interference can occur between the multi-stage high-order diffraction light, and the multi-stage h...
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IPC IPC(8): G03F7/20
CPCG03F7/70258G03F7/706
Inventor 唐锋王向朝彭常哲刘洋卢云君
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI