Circuit board production equipment based on vacuum etching technology

Abstract

The invention relates to the technical field of etching, and discloses circuit board production equipment based on a vacuum etching technology. The equipment comprises a base, two clamping plates, anetching cylinder, a rotating motor, a turntable, a vacuum device and an etching device, and is characterized in that the bottom surface of the etching cylinder is in a hollow state, the clamping plates are inverted L-shaped bodies, and the two clamping plates are opposite to each other left and right; the surfaces, deviating from each other, of the two clamping plates are curved and are matched with the inner wall of the etching cylinder, the vacuum device and the etching device are both arranged on the etching cylinder, and through arrangement of the vacuum device, a vacuum effect is formed in the whole etching cylinder by utilizing a continuous air exhaust effect, so that dust and the like in the base are powerfully extracted, and the etching efficiency is improved. Therefore, dust in the base or on the circuit board before etching and smoke and impurities generated by chemical reaction in the etching process are removed, the cleanliness of the circuit board after etching is improved, the problem that the quality of the circuit board is reduced due to the fact that the smoke and the impurities such as the dust participate in the etching process is solved, and compared with an existing cleaning mechanism on an etching machine, the cleaning range is more comprehensive, and the cleaning force is stronger.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to circuit board production equipment based on vacuum etching technology. Background technique [0002] Existing etching machines for circuit boards mostly use the method of spraying chemical solutions to etch the exposed metal parts, so as to obtain the required geometric patterns and high-precision dimensions. [0003] The existing patent No. CN102092955A proposes an etching device, which has the advantage of reducing the occurrence of etching defects, but it lacks the effect of effectively cleaning the etching environment and impurities on the circuit board and effectively recovering the etching solution before and during etching. This leads to the reduction of the etching effect of the circuit board and the reduction of the efficiency of the front and rear processing. [0004] The existing patent No. CN103208438A proposes an etching device, which has the advantages of saving co...

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Problems solved by technology

[0003] The existing patent No. CN102092955A proposes an etching device, which has the advantage of reducing the occurrence of etching defects, but it lacks the effect of effectively cleaning the etching environment and impurities on the circuit board and effectively recovering the etching solution before and during etching. The problem that the etching effect of the circuit board is reduced and the efficiency of the front and rear processing is reduced

[0004] The existing patent No. CN103208438A proposes an etching device, which has the advantages of saving costs, shortening the manufacturing process time and increasing production capacity, but it uses various electrical components such as vacuum pumps, pneumatic cylinders and conveying components, so that it has high Equipment cost and power consumption, as well as high equipment volume, and the above conditions make the use conditions of the equipment lead to the problem of high requirements for the use environment

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