Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Product Surface Defect Detection Method, Memory and Processor Based on Wavelet Transform

A technology of wavelet transform and defect detection, which is applied in image data processing, optical test defect/defect, instrument, etc., to achieve the effect of simple detection method, practicability and simple debugging

Active Publication Date: 2021-04-02
深圳华工量测工程技术有限公司
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] In order to overcome the deficiencies of the above-mentioned prior art, the present invention provides a product surface defect detection method, memory and processor based on wavelet transform. The method only needs to adjust the wavelet kernel size and wavelet direction to adaptively filter complex images Background, highlighting defect areas, to achieve the purpose of detecting different types of defects with one method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Product Surface Defect Detection Method, Memory and Processor Based on Wavelet Transform
  • Product Surface Defect Detection Method, Memory and Processor Based on Wavelet Transform
  • Product Surface Defect Detection Method, Memory and Processor Based on Wavelet Transform

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.

[0043] It should be noted that the terms "first", "second" and the like in the description and claims of the present invention and the above drawings are used to distinguish similar objects, and are not necessarily used to describe a specific sequence or sequence. It is to be understood that the data so used may be interchanged under appropriate circumstances such that the embodiments of the invention described herein can be practiced in sequences other than those illustrated or describ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a product surface defect detection method, memory and processor based on wavelet transform. The invention first reads the original image of the product, then inputs the wavelet kernel size and wavelet direction, uses wavelet transform to calculate and generate wavelet kernel, and then uses wavelet The kernel and the original image of the product are convolved to obtain a filtered image, which realizes adaptive filtering of complex image backgrounds and highlights defect areas; for different types of defects, wavelet kernels and wavelet directions of different sizes can be input for defect detection to realize One method detects different types of defects, without developing image processing algorithms for a certain type or several types of defects, which greatly reduces the development cost.

Description

technical field [0001] The invention relates to the technical field of product surface defect detection, in particular to a product surface defect detection method, memory and processor based on wavelet transform. Background technique [0002] At present, with the development of the machine vision industry, more and more machine equipment is used to replace manual visual inspection in product surface defect detection. In appearance inspection, common defects include scratches, abrasions, stab wounds, concave and convex pits, mold printing, edge chipping, different colors, and lack of ink. These defects are usually distributed in different areas of the product, and due to the different locations of different types of defects, the defect backgrounds are different, which brings great inconvenience to image analysis. [0003] The mainstream detection equipment in the industry basically uses industrial cameras to capture images and then use software algorithms for image analysis...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06T7/00G06T7/11G06T7/136G06T5/20G01N21/88
CPCG01N21/8851G01N2021/8887G06T5/20G06T7/0004G06T2207/20024G06T2207/20064G06T7/11G06T7/136
Inventor 吴巍刘亮王建刚
Owner 深圳华工量测工程技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products