Calibration Method of System Parameters of Rotating Device Muller Matrix Ellipsometer

Abstract

The invention belongs to the technical field related to system calibration of precision optical measuring instruments, and discloses a method for calibrating system parameters of a rotating device type Mueller matrix ellipsometer. and the objective lens are respectively replaced with 1 / 4 standard wave plate and reflector; the azimuth angle of the 1 / 4 standard wave plate is rotated multiple times, and multiple azimuths are respectively obtained from the detector of the rotating device type Mueller matrix ellipsometer The light intensity information under the corner; the Fourier analysis of the light intensity information is carried out to obtain the Fourier coefficient of the light intensity information; the relationship model between the Fourier coefficient of the light intensity information and the system parameters to be calibrated is established; the relationship model is continuously adjusted. Calibrate the value of the system parameter until the error between the Fourier coefficient in the relational model and the above-mentioned Fourier coefficient is within the preset range, then the value corresponding to the system parameter to be calibrated at this time is the calibration value. The method can realize the calibration of multiple calibration values ​​through two-step calibration, which is simple and convenient.

Description

technical field [0001] The invention belongs to the technical field related to system calibration of precision optical measuring instruments, and more specifically relates to a method for calibrating system parameters of a rotating device type Mueller matrix ellipsometer. Background technique [0002] The rotating device type ellipsometer is a commonly used type of ellipsometer, which has the advantages of simple modulation, high measurement accuracy, and non-destructive measurement. Rotating device-type high-resolution imaging Mueller matrix ellipsometer is based on the double-rotating compensator-type Mueller matrix ellipsometer, combined with microscopic imaging technology, using the Mueller matrix containing more polarization information, it can completely characterize the sample Polarization characteristics, such as depolarization, etc., and high spatial resolution, can realize the distribution measurement of micro-area materials, so it has greater advantages than tradi...

AI Technical Summary

Problems solved by technology

[0004] The existing calibration methods rarely consider the polarization aberration of the objective lens during calibration, or use offline calibration to calibrate the beam splitter and objective lens. The calibration process is cumbersome, the calibration error is large, the calibration speed is slow, and the universality is poor. Precise Measurement Requirements of Rotating Device Type High Resolution Imaging Mueller Matrix Ellipsometer

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