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Method for calibrating system parameters of rotating device type Mueller matrix ellipsometer

A Muller matrix and calibration method technology is applied in the field of calibration of rotating device type Muller matrix ellipsometer system parameters, which can solve the problem that the calibration speed is slow and cannot meet the precise measurement of rotating device type high-resolution imaging Muller matrix ellipsometer. requirements, less consideration of the polarization aberration of the objective lens, etc.

Active Publication Date: 2021-02-19
HUAZHONG UNIV OF SCI & TECH
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Problems solved by technology

[0004] The existing calibration methods rarely consider the polarization aberration of the objective lens during calibration, or use offline calibration to calibrate the beam splitter and objective lens. The calibration process is cumbersome, the calibration error is large, the calibration speed is slow, and the universality is poor. Precise Measurement Requirements of Rotating Device Type High Resolution Imaging Mueller Matrix Ellipsometer

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  • Method for calibrating system parameters of rotating device type Mueller matrix ellipsometer
  • Method for calibrating system parameters of rotating device type Mueller matrix ellipsometer
  • Method for calibrating system parameters of rotating device type Mueller matrix ellipsometer

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[0048]In order to make the objectives, technical solutions and advantages of the present invention clearer, the following further describes the present invention in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0049]The principle diagram of the optical path of the rotating device-type Muller matrix ellipsometer system that needs to be calibrated in the present invention is as followsfigure 1 Shown. The rotating device-type Muller matrix ellipsometer system includes a light source 101. The light source emits a light beam to a collimator 102 for collimation, and then sends the collimated light beam to a plane mirror ...

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Abstract

The invention belongs to the related technical field of precision optical measurement instrument system calibration, and discloses a method for calibrating system parameters of a rotating device typeMueller matrix ellipsometer, which comprises the following steps of respectively replacing an imaging lens and an objective lens of the rotating device type Mueller matrix ellipsometer with a 1 / 4 standard wave plate and a reflector, rotating the azimuth angle of the 1 / 4 standard wave plate multiple times, and acquiring light intensity information under multiple azimuth angles from a detector of the rotating device type Mueller matrix ellipsometer, performing Fourier analysis on the light intensity information to obtain a Fourier coefficient of the light intensity information, establishing a relation model between the Fourier coefficient of the light intensity information and the parameters of the system to be calibrated, and continuously adjusting the value of the system parameter to be calibrated in the relation model until the error between the Fourier coefficient in the relation model and the Fourier coefficient is within a preset range, wherein the value corresponding to the systemparameter to be calibrated is the calibration value. According to the method, calibration of a plurality of calibration values can be realized through two-step calibration, and the method is simple and convenient.

Description

Technical field[0001]The invention belongs to the technical field related to the calibration of precision optical measuring instrument systems, and more specifically relates to a method for calibrating system parameters of a rotating device-type Muller matrix ellipsometer.Background technique[0002]Rotating device type ellipsometer is a common type of ellipsometer, which has the advantages of simple modulation, high measurement accuracy, and non-destructive measurement. Rotating device-type high-resolution imaging Muller matrix ellipsometer is based on the dual-rotation compensator-type Muller matrix ellipsometer, combined with microscopic imaging technology, using the Muller matrix containing more polarization information, can completely characterize the sample The polarization characteristics, such as depolarization, and so on, at the same time have a high spatial resolution, can realize the distribution measurement of the micro-area material, so it has greater advantages than the ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/21G06F17/14G06F17/16
CPCG01N21/211G06F17/14G06F17/16
Inventor 陈修国陈超盛胜周军宏刘世元
Owner HUAZHONG UNIV OF SCI & TECH
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