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Measuring device and photolithography machine

A measurement device and quantity technology, applied in the field of lithography, can solve the problems of low stability of lithography machines, achieve the effects of reducing design and implementation difficulty, improving stability, and effectively cooling down

Active Publication Date: 2022-04-01
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to provide a measuring device and a lithography machine to solve the problem of low stability of the existing measuring devices and lithography machines

Method used

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  • Measuring device and photolithography machine
  • Measuring device and photolithography machine
  • Measuring device and photolithography machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0055] This embodiment provides a measuring device for detecting the polarization phase difference of the measuring light. refer to figure 2 , image 3 and Figure 4 , figure 2 It is a schematic structural diagram of the measurement device installed in the photolithography machine in Embodiment 1 of the present invention, image 3 is a schematic structural view of the measuring device in Embodiment 1 of the present invention, Figure 4 It is another structural schematic diagram of the measuring device 150 in the first embodiment of the present invention. The measuring device 150 includes a measuring body 210 , a wave plate 220 , a polarizing plate 230 , a rotary table 240 and an image acquisition and analysis unit 250 . The rotary table 240, the polarizer 230 and the image acquisition and analysis unit 250 are arranged on the measurement body 210, the rotary table 240 is used to drive the wave plate 220 to rotate, and the measurement light passes through the wave plate ...

Embodiment 2

[0083] This embodiment provides a measuring device 150 . The difference between the measuring device 150 in this embodiment and the measuring device 150 in Embodiment 1 is that in this embodiment, no cooling channel is provided in the first cooling member 310, and no cooling medium is provided in the first cooling member 310 , the third cooling member 330 is provided with a cooling channel, and a cooling medium is provided in the cooling channel.

[0084] refer to Figure 6 and Figure 7 , Figure 6It is a structural schematic diagram of the measuring device 150 in the second embodiment of the present invention, Figure 7 It is another structural schematic diagram of the measuring device 150 in the second embodiment of the present invention. The measuring device 150 includes a measuring body 210, a wave plate 220, a polarizing plate 230, a rotating table 240, an image acquisition and analysis unit 250 and a cooling assembly. The rotating table 240 , the polarizer 230 , the...

Embodiment 3

[0098] This embodiment provides a measuring device 150 . The difference between the measurement device 150 in this embodiment and the measurement device 150 in Embodiment 1 is that in this embodiment, cooling passages are also provided in the second cooling member 320 and the third cooling member 330, and there are cooling passages in the cooling passages. medium, the cooling passages in the first cooling element 310 , the second cooling element 320 and the third cooling element 330 communicate with each other.

[0099] refer to Figure 8 and Figure 9 , Figure 8 is a schematic structural view of the measuring device 150 in Embodiment 3 of the present invention, Figure 9 It is another schematic diagram of the structure of the measurement device 150 in the third embodiment of the present invention. The measurement device 150 includes a measurement body 210, a wave plate 220, a polarizer 230, a rotary table 240, an image acquisition and analysis unit 250 and a cooling assem...

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Abstract

The invention provides a measuring device and a lithography machine, the measuring device is used to detect the polarization phase difference of the measuring light, the measuring device includes a measuring body, a wave plate, a polarizing plate, a rotating table and an image acquisition and analysis unit, the rotating The table, the polarizer and the image acquisition and analysis unit are arranged on the measurement body, the rotating table is used to drive the wave plate to rotate, and the measurement light enters after passing through the wave plate and the polarizer The image acquisition and analysis unit, the image acquisition and analysis unit is used to collect and analyze the measurement light and obtain the polarization phase difference, the measurement device also includes a cooling component, the cooling component is used to absorb the image acquisition and analysis unit and / or the heat of the turntable. The measurement device and the lithography machine in the present invention can improve the stability of the measurement device and the lithography machine.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a measuring device and a photolithography machine. Background technique [0002] For an immersion projection lithography machine, the measurement result of the polarization phase difference of the projection objective lens easily affects the resolution of the lithography machine. At present, photolithography machines mostly use measuring devices to measure the polarization phase difference of the projection objective lens. However, most of the existing measurement devices have the problem of low stability. The measurement results of the polarization difference of the projection objective lens have low stability. low stability. [0003] Therefore, there is an urgent need to improve the existing measurement device to improve the stability of the measurement device, thereby improving the stability of the photolithography machine. Contents of the invention [0004] The ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01M11/02
CPCG03F7/70591G03F7/7055G01M11/0207
Inventor 赵钦浩
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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