Method for realizing flexible process control of atomic layer deposition coating equipment

Abstract

The invention relates to a method for realizing flexible process control of atomic layer deposition coating equipment. The flexible process control is realized by making a process file for controllinga film forming process of the atomic layer deposition coating equipment. The method comprises the following steps of: recording process information in a process text file mode, wherein the process information can be adjusted by modifying a self-defined text in the process text file; compiling the process text file through a compiler, and converting the process text file containing the process information into a rule file which accords with a program definition of a controller; and identifying and processing the rule file through the controller, and controlling the working state of the atomiclayer deposition coating equipment according to the rule file, so that the atomic layer deposition coating equipment executes the process information contained in the rule file. The method has the advantages that: a process worker directly modifies the process file without modifying a control program, so that error hidden dangers generated in the communication process are avoided, the design and test time of the control program is saved, and the process development efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a method for realizing flexible process control of atomic layer deposition coating equipment. Background technique [0002] Atomic layer deposition is a special chemical vapor deposition technology, which is a method of forming a deposited film by alternately injecting pulses of gaseous precursors into the reaction chamber, chemically adsorbing and reacting on the substrate. [0003] The atomic layer deposition equipment is mainly composed of a precursor supply system, a carrier gas system, a film forming chamber, an exhaust system, and a heating system. Such as figure 1 As shown, source 1, source 2, and source 3 are precursors. When the atomic layer deposition process is carried out, the precursor of source 1 is passed through the into the film-forming cavity. Then purging is carried out to clean up the excess precursor, and then the precursor of source 2 is int...

AI Technical Summary

Problems solved by technology

If the existing process control method is used, the craftsman will tell the software designer the process requirements, and the software designer will write a fixed control program according to the requirements of the craftsman, and then hand it over to the craftsman for film formation test after the program is debugged. The number of control program design and testing is too many, and the process development cycle is long; the control program is revised many times, the program is not unified, and program management is difficult. At the same time, due to insufficient communication or understanding, there may be differences between the requirements of the process personnel and the actual control. inconsistency

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