Substrate edge washing method, edge washing device and substrate

A substrate and edge washing technology, applied in nonlinear optics, instruments, optics, etc., can solve the problem of inaccurate judgment of edge washing amount, and achieve the effect of improving cleaning efficiency

Inactive Publication Date: 2021-03-16
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, the amount of edge washing on the substrate is judged by human eyes, which causes the problem of inaccurate judgment on the amount of edge washing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate edge washing method, edge washing device and substrate
  • Substrate edge washing method, edge washing device and substrate
  • Substrate edge washing method, edge washing device and substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0034] In the embodiments of the present invention, it should be understood that terms such as "comprising" or "having" are intended to indicate the presence of features, numbers, steps, acts, components, parts or combinations thereof disclosed in this specification, and are not intended to The possibility that one or more other features, numbers, steps, acts, parts, parts or combinations thereof exist or be added is excluded.

[0035] Embodiments of the present application prov...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The embodiment of the invention provides a substrate edge washing method, an edge washing device and a substrate. The substrate edge washing method comprises the following steps of: setting a corresponding identifier at the edge of a corresponding film layer of the substrate, detecting the identifier position in the edge washing process of an edge washing machine, and determining the edge washingamount of the substrate according to the distance between the identifier position and the identifier. According to the invention, the edge washing amount of the substrate is determined according to the distance between the identifier position and the identifier. Therefore, manual determination of the edge washing amount is avoided, the edge washing amount of the substrate can be determined more precisely, the substrate can be cleaned more precisely, and the cleaning efficiency is improved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a substrate edge cleaning method, an edge cleaning device and a substrate. Background technique [0002] Liquid crystal display (Liquid Crystal Display, LCD) is currently the most widely used display product in the market. Its production process technology is very mature, the product yield rate is high, the production cost is relatively low, and the market acceptance is high. The TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-Liquid Crystal Display) panel manufacturing industry has been developed for many years, and the production process of the product has been very refined and mature. [0003] In recent years, large-size liquid crystal displays have developed rapidly. In the preparation process, in addition to the necessary precision optical instrument exposure machine, it is also necessary to use an edge exposure machine for edge washing...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13
CPCG02F1/1303
Inventor 邓帆
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap