Mask detection mechanism

A detection mechanism and mask technology, applied in the direction of optical testing flaws/defects, etc., can solve the problems of mask damage, complex structure of the detection mechanism, etc., and achieve the effect of simple structure and low degree of manual dependence

Pending Publication Date: 2021-03-26
德清炬诚电子科技有限公司
View PDF1 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The detection mechanism in the above-mentioned patent has a complex structure, and will cause a certain degree of damage to qualified masks when used

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask detection mechanism
  • Mask detection mechanism

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0019] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " The orientations or positional relationships indicated by "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "clockwise", "counterclockwise" are based on the attached The orientation or positional relationship shown in the figure is only for the convenience of describing the present invention and simplifying the description...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of mask production, and in particular, relates to a mask detection mechanism. A mask detection mechanism in the prior art is complex in structure, and a qualified mask can be damaged to a certain extent when the mask detection mechanism is used. For solving the problem, the following technical scheme is adopted: the mask detection mechanism comprises aconveying belt and a mask detection assembly, the mask detection assembly comprises a detector and a data processing device which are arranged above the conveying belt, the detector is in communication connection with the data processing device, and the data processing device can identify a defective mask through the signal transmitted by the detector. According to the technical scheme, the detection mechanism can be smoothly connected with a production line, automatic defective mask screening can be achieved, the structure is simple, and the manual dependence degree is low.

Description

technical field [0001] The invention relates to the technical field of mask production, in particular to a mask detection mechanism. Background technique [0002] For respiratory infectious diseases, masks are an important line of defense for personal protection. In the production of masks, avoiding defective masks entering the market can avoid unnecessary risks for people during epidemic prevention. The mask production line often needs manual inspection of defective products. The existing mask defective product inspection institutions are often complex in structure, which is not convenient for personnel to intuitively manage. [0003] For example, the publication number is "CN111703657A", and the name is a Chinese invention patent for a mask packer capable of quality inspection, which discloses a mask packer capable of quality inspection, including a packer body, and the inside of the packer body is There is a conveying chamber with an opening to the left, a detection she...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/89
CPCG01N21/89
Inventor 彭勇
Owner 德清炬诚电子科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products