A polishing device for chemical preparation equipment maintenance

Abstract

The invention relates to the technical field of chemicals, and discloses a polishing device for chemical preparation equipment maintenance. A rotating drum is connected. The interior of the rotating drum is hollow and communicated with the liquid cylinder. The outer wall of the rotating drum is fixedly connected with a polishing shell. The inner wall of the rotating drum is sleeved with a piston A. The hole and the connecting plate are sleeved in the hole, a rectangular hole is opened at the position corresponding to the connecting plate on the front of the polishing shell, and a spray block is sleeved in the hole, and the back of the spray block is fixedly connected and communicated on the side corresponding to the two connecting plates that are away from each other. There is a liquid pipe, through the setting of the spray block, the polishing liquid is sprayed by pressure during the polishing process, so as to achieve the effect of automatically spraying the polishing liquid, improve the automation of the device, and improve the polishing efficiency, and no additional polishing liquid spraying device is required. Reduced equipment costs.

Description

technical field [0001] The invention relates to the technical field of chemicals, in particular to a polishing device for maintenance of chemical preparation equipment. Background technique [0002] During the maintenance of chemical preparation equipment, it is necessary to polish the surface part of the equipment that is corroded by chemicals or condensed and accumulated by chemical residues, so it is necessary to use a corresponding polishing device. [0003] The existing patent number CN108406555B proposes a polishing device, which has the advantages of liberating manpower, improving work efficiency, and having a moderate volume. However, it lacks a mechanism for automatically spraying polishing liquid, and an additional polishing liquid spraying mechanism needs to be added, resulting in equipment costs and assembly. increase in difficulty. [0004] The existing patent number CN106737086B proposes a polishing device, which has the function of reducing the throwing of po...

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Problems solved by technology

[0003] The existing patent number CN108406555B proposes a polishing device, which has the advantages of liberating manpower, improving work efficiency, and moderate volume, but it lacks the mechanism for automatically spraying the polishing liquid, and an additional polishing liquid spraying mechanism needs to be added, resulting in equipment costs and assembly. increase in difficulty

[0004] The existing patent No. CN106737086B proposes a polishing device, which has the function of reducing the spraying of the polishing liquid and having a small volume, but it cannot spray the polishing liquid at a fixed point at the polishing position during use, and in the polishing of chemical preparation equipment, Most of the chemical condensation residue and erosion are dispersed. If the polishing liquid cannot be sprayed on the polishing point, it will lead to useless waste of the polishing liquid.

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