Sealing ring structure and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 湖南三安半导体有限责任公司
- Publication Date
- 2021-04-23
Smart Images

Figure 1 
Figure 2 
Figure 3
Abstract
Description
technical field
[0001] The invention relates to the technical field of integrated circuits, in particular, it is applied to semiconductor devices, and relates to a sealing ring structure and a preparation method thereof. Background technique
[0002] Electro-Static discharge (ESD) is the phenomenon of charge release and transfer between integrated circuit chips and external objects. Due to the release of a large amount of charge in a short period of time, the energy generated by ESD is much higher than the capacity of the chip, so it is likely to cause temporary failure or even permanent damage to the function of the chip. Therefore, in order to avoid damage to integrated circuits by static electricity as much as possible, electrostatic discharge protection design is very important in improving product reliability and yield.
[0003] Generally, an integrated circuit is separately provided with an electrostatic protection structure, so as to protect the integrated circuit wh...