Unlock instant, AI-driven research and patent intelligence for your innovation.

Scanning method of photoetching system and photoetching system

A technology of lithography system and scanning method, which is applied in the direction of microlithography exposure equipment, optics, optomechanical equipment, etc., can solve the problem of high cost of DMD replacement

Active Publication Date: 2021-05-07
GIS TECH INC
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a scanning method of a lithography system and a lithography system, and then solve the problem of high replacement cost of DMDs with different parameters when the resolution needs to be changed in the existing solutions

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Scanning method of photoetching system and photoetching system
  • Scanning method of photoetching system and photoetching system
  • Scanning method of photoetching system and photoetching system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0055] Below, the present invention will be further described in conjunction with the accompanying drawings and specific implementation methods. It should be noted that, under the premise of not conflicting, the various embodiments described below or the technical features can be combined arbitrarily to form new embodiments. .

[0056] For ease of description, a brief introduction to the implementation environment involved in this application is firstly made.

[0057] Please refer to figure 1, the lithography system provided in the present application includes a machine 11 , a workbench 12 and a DMD 13 , the DMD 13 is set on the machine 11 , and the workbench 12 is used to set a lithography object 100 . Both the machine table 11 and the worktable 12 can be controlled by the mechanical arm to realize movement, and the movement of the machine table 11 can be controlled to realize the movement of the DMD 13 with the machine table 11. Similarly, by controlling the movement of the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a scanning method of a photoetching system and a photoetching system, and relates to the technical field of photoetching. The method is applied to the photoetching system; the photoetching system comprises a machine table, a working table and a digital micromirror device (DMD); the DMD is arranged on the machine table; and the working table is used for setting a to-be-photoetched object. The method comprises the steps that: a movement main body is controlled to move so that the DMD and the to-be-photoetched object can move relatively in the first direction and the second direction at the same time, and the movement main body comprises at least one of the DMD, the machine table and the workbench. According to the prior art, when definition needs to be changed, DMDs with different parameters need to be replaced, and as a result, the cost is high. With the scanning method of the photoetching system and the photoetching system of the invention adopted, the above problem can be solved, and definition adjustment can be conveniently and rapidly achieved by adjusting the movement speed of the movement main body.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a scanning method of a photolithography system and a photolithography system. Background technique [0002] Photolithography refers to the technology of printing graphics on photosensitive recording materials by optical replication, and then transferring the graphics to wafers by etching to make electronic circuits. [0003] DMD (Digital Micromirror Device, digital micromirror device) maskless lithography technology is a new technology derived from traditional optical lithography technology, because its exposure imaging method is basically similar to traditional projection lithography, the difference is that it uses digital DMD replaces the traditional mask. Its main principle is to input the required photolithography pattern into the DMD chip through the software through the computer, change the corner of the DMD chip micromirror according to the distribution of black a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/704G03F7/70725
Inventor 陈国军吴景舟马迪
Owner GIS TECH INC