Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-layer mask protective helmet and manufacturing method thereof

A mask and helmet technology, applied in the field of double-layer mask protective helmet and its production, can solve the problem that gas masks and protective masks cannot be used at the same time, so as to facilitate adjustment of head circumference and wearing depth, enhance protective performance, and improve light transmittance. high effect

Pending Publication Date: 2021-06-01
BEIJING PT PROTECTION TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a double-layer mask protective helmet and a manufacturing method thereof. Through the independent protective structure design of the double-layer mask, the deficiency that the existing gas mask and the protective mask cannot be used at the same time is effectively solved. Through the overall structure The further optimized design and production process greatly enhanced the protective effect of the protective helmet. Wearing a gas mask is easy to operate, the overall weight of the helmet is light, and the protection level is high, which is suitable for promotion

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-layer mask protective helmet and manufacturing method thereof
  • Double-layer mask protective helmet and manufacturing method thereof
  • Double-layer mask protective helmet and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] Preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0043] refer to Figure 1 to Figure 4 As shown, a protective helmet with a double-layer mask includes: a helmet shell, a cushioning layer, a liner, a face shield and a neck guard;

[0044] Further, the helmet shell comprises: an outer shell 1 and an inner shell 9 bonded together by an adhesive;

[0045] The outer casing 1 is injection molded by an injection molding machine using a PC / ABS alloy material;

[0046] The inner casing 9 adopts multi-layer impregnated PE non-weft cloth or PE woven cloth, and is molded;

[0047] As an example, PE non-woven fabric and ultra-high molecular weight polyethylene fiber, also known as high-strength and high-modulus polyethylene fiber, are the fibers with the highest specific strength and specific modulus in the world; PE non-woven fabric or woven fabric has high specific strength , high specific modulus,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a double-layer mask protective helmet and a manufacturing method thereof. The double-layer mask protective helmet comprises a helmet shell, a buffer layer, a liner, a mask and a neck guard. The helmet shell comprises an outer shell and an inner shell which are bonded together through a binder; the buffer layer is arranged under the inner shell; the liner is arranged under the buffer layer; the mask is arranged on the front face of the helmet shell and is of a double-layer structure with an upper piece and a lower piece; the upper piece of mask is used for protecting the front face of the head; and the lower piece of mask is used for protecting the lower jaw part; and the neck guard is arranged on the back face of the helmet shell and is formed by sewing flame-retardant fabric with a protective layer liner. Through the optimized design and manufacturing method of the whole structure, the defect that an existing gas mask and an existing protective mask cannot be used at the same time is effectively overcome, the protective effect of the protective helmet is greatly enhanced, the gas mask is easy and convenient to wear; and the helmet is light in overall weight, high in protection level and suitable for popularization.

Description

technical field [0001] The invention belongs to the technical field of military protective helmets, in particular to a double-layer mask protective helmet and a manufacturing method thereof. Background technique [0002] The anti-riot helmet is a protective device that must be worn by individual soldiers in the process of performing anti-riot tasks. It is mainly used to effectively protect the head, face and neck of individual soldiers performing anti-riot tasks. Attacks with explosive projectiles and chemical liquids; [0003] For example: anti-riot helmets are required to have a certain bulletproof function, that is, to have the ability to protect the Type 97-1 shotgun from firing Type 97 18.4mm anti-destructive bullets, and to wear gas masks and other protective equipment conveniently; [0004] In the prior art, there is a common anti-riot helmet, which mainly adopts a metal plate press-molded shell, an engineering plastic injection-molded shell, and a high-strength fibe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A42B3/06A42B3/04A42B3/12A42B3/10A42B3/20A42B3/32C08L69/00C08L55/02A42C2/00
CPCA42B3/04A42B3/0406A42B3/06A42B3/063A42B3/10A42B3/105A42B3/125A42B3/20A42B3/205A42B3/326A42C2/00C08L55/02C08L69/00
Inventor 王成
Owner BEIJING PT PROTECTION TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products