Additive manufacturing self-supporting structure topological optimization method suitable for variable critical angle

A self-supporting structure, topology optimization technology, applied in design optimization/simulation, special data processing applications, instruments, etc., can solve problems such as the need for support, and achieve the effect of optimal design

Active Publication Date: 2021-06-15
XI AN JIAOTONG UNIV
View PDF8 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a topology optimization method for additive manufacturing self-supporting structures with variable critical angles, which realizes the optimal design of self-supporting structures with variable critical angles, saves printing materials and time, and solves the problem of traditional topology optimization structures. Issues requiring support during printing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Additive manufacturing self-supporting structure topological optimization method suitable for variable critical angle
  • Additive manufacturing self-supporting structure topological optimization method suitable for variable critical angle
  • Additive manufacturing self-supporting structure topological optimization method suitable for variable critical angle

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0042] The method proposed by the present invention can be used for the plane problem of self-supporting structure design oriented to additive manufacturing. The following describes the specific implementation process of the present invention in conjunction with the case and accompanying drawings. figure 1 A flow diagram of the invention is shown.

[0043] (1) Pretreatment

[0044] The specific steps are as follows:

[0045]1) Define the geometric model of the cantilever beam, such as figure 2 As shown, the cantilever beam structure is optimally designed along the +Y direction, taking L=160, H=100 as an example for calculation and description;

[0046] 2) Set the critical angle α, define the length and width of the four-node rectangular element as a and b respectively, and satisfy b=a×tan α, such as image 3 As shown, take α=30°, a=1, b=tan 30° as ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an additive manufacturing self-supporting structure topological optimization method suitable for a variable critical angle. The method comprises the steps of 1, pretreatment, wherein a structure geometric model and a discrete design domain are defined, boundary conditions are added, design variables are initialized, and optimization parameters are set; 2, topological optimization of the self-supporting structure: constructing an additive manufacturing self-supporting structure topological optimization mathematical model adaptive to a variable critical angle, and solving to obtain an optimal layout of the unit density of a design domain; and 3, post-processing: setting a unit size, and extracting a density contour surface to obtain an optimal self-supporting structure design scheme. A four-node rectangular unit discrete structure design domain with the variable length-width ratio is adopted, a self-supporting unit filtering method with the variable critical angle is constructed based on the design domain, an additive manufacturing self-supporting structure topological optimization method with the variable critical angle is established, optimization design adapts to a self-supporting structure with the variable critical angle, no support is achieved in the printing process, and printing materials and time are saved.

Description

technical field [0001] The invention belongs to the related field of structural optimization design, and in particular relates to a method for topology optimization of a self-supporting structure adapted to additive manufacturing with a variable critical angle. Background technique [0002] In recent years, additive manufacturing technology has developed rapidly due to its outstanding advantages of being able to manufacture complex structures, providing a powerful tool for structural preparation and broadening the space for structural design. However, there are some process constraints in additive manufacturing, especially when forming overhanging features, it is often necessary to add supports below them, and then manually remove them after printing, which greatly wastes printing materials and time, and also affects the performance and surface quality of parts. caused damage. [0003] In response to this problem, some scholars have begun to study the topology optimization ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/23G06F113/10
CPCG06F30/23G06F2113/10
Inventor 王雷赵强强洪军
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products