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Polishing method for removing subsurface layer damage on surface of optical element

A technology for optical components and subsurface layers, which can be used in optical surface grinders, grinding/polishing equipment, grinders, etc., and can solve problems such as low efficiency

Pending Publication Date: 2021-07-06
CHINA WEAPON SCI ACADEMY NINGBO BRANCH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the efficiency of the vacuum plasma polishing method is too low, and for the polishing of optical components, it is necessary to take into account both polishing accuracy and polishing efficiency

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] The initial surface roughness of the optical element of the preferred embodiment is Ra2.45nm, and the polishing method for removing the subsurface layer damage on the surface of the optical element comprises the following steps:

[0035] Step 1: Classical polishing of optical components, which in turn includes the following steps:

[0036] (1.1) First pre-polish the optical components. The pre-polishing method is: first coat the polar solvent methyl ether on the surface of the optical components, and then place the optical components on the glue spinner to rotate at a speed of 3000r / min for 2 minutes, and then Rinse the optical components with deionized water for 5 minutes;

[0037] (1.2) Pressurize the optical element to 4Mpa, and control the spindle speed of the machine tool at 30rpm;

[0038] (1.3) Preheat the polishing mold. The method of preheating the polishing mold is: put the polishing mold in warm water at 50°C for 5 minutes;

[0039] (1.4) Add polishing liqu...

Embodiment 2

[0053] The difference between embodiment 2 and embodiment 1 is:

[0054]In (1.5) of step one, the polishing time is 90min, and others are the same as step one of embodiment 1; after classical polishing, Ra=1.69nm, Rvmax=87.3nm;

[0055] In step 2 (2.5), the polishing time is 30 min, and the others are the same as step 2 of embodiment 1; after plasma polishing, Ra=0.84nm, Rvmax=5.367nm.

[0056] From the comparison of Example 1 and Example 2, it can be seen that simply prolonging the polishing time of classical polishing cannot continue to effectively eliminate subsurface damage. Although after plasma polishing, the Ra of the sample does not change much compared with classical polishing, but Rvmax changed significantly, and the surface damage layer density decreased significantly; moderately prolonging the plasma polishing time, a surface with a smaller damage depth could be obtained.

Embodiment 3

[0058] The initial surface roughness of the optical element of the preferred embodiment is Ra2.45nm, and the polishing method for removing the subsurface layer damage on the surface of the optical element comprises the following steps:

[0059] Step 1: Classical polishing of optical components, which in turn includes the following steps:

[0060] (1.1) First pre-polish the optical components. The pre-polishing method is: first coat the polar solvent methyl ether on the surface of the optical components, and then place the optical components on the glue spinner to rotate at a speed of 3000r / min for 2 minutes, and then Rinse the optical components with deionized water for 10 minutes;

[0061] (1.2) Pressurize the optical element to 4Mpa, and control the spindle speed of the machine tool at 30rpm;

[0062] (1.3) Preheat the polishing mold. The method of preheating the polishing mold is: put the polishing mold in warm water at 50°C for 5 minutes;

[0063] (1.4) Add polishing liq...

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Abstract

The invention relates to a polishing method for removing subsurface layer damage on the surface of an optical element, the polishing method is characterized by comprising the following steps of 1, carrying out classical polishing on the optical element; and 2, carrying out vacuum plasma polishing on the optical element obtained after classical polishing. According to the polishing method, a composite polishing technology of classical polishing and plasma polishing is adopted, so that the surface and subsurface damage of the optical element can be obviously eliminated, and the composite polishing technology can effectively overcome the problems that the surface and subsurface damage of the optical element is caused by classical polishing and the polishing efficiency of plasma polishing is low, namely classical polishing and plasma polishing are combined, so that the polishing efficiency and the removal of a damaged layer can be both considered.

Description

technical field [0001] The invention belongs to the technical field of optical processing, and in particular relates to a polishing method for removing subsurface layer damage on the surface of an optical element. Background technique [0002] For applications such as inertial confinement nuclear fusion and remote imaging detection, optical components need to meet the requirements of ultra-smoothness and low loss, and their manufacturing methods must meet the requirements of eliminating surface defects and subsurface damage. Subsurface damage of optical components is defects such as microcracks, fractures, and deformations hidden under the surface of optical components, which will cause light scattering and signal loss, and increase the damage threshold of laser light. For high-performance optical components, there are generally strict requirements on their subsurface damage. [0003] In order to reduce the subsurface damage to optical elements during the polishing process,...

Claims

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Application Information

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IPC IPC(8): B24B1/00B24B13/00
CPCB24B1/00B24B13/00
Inventor 裴宁王大森聂凤明张旭李晓静夏超翔郭海林刘敏周静李维杰
Owner CHINA WEAPON SCI ACADEMY NINGBO BRANCH
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