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Testing device of dynamic gas lock and testing method using same

A technology of dynamic gas lock and testing device, applied in the field of extreme ultraviolet lithography

Pending Publication Date: 2021-08-20
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The purpose of the present invention is to at least solve the problem that existing dynamic gas locks need to be tested and evaluated for performance

Method used

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  • Testing device of dynamic gas lock and testing method using same
  • Testing device of dynamic gas lock and testing method using same
  • Testing device of dynamic gas lock and testing method using same

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Embodiment Construction

[0044] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0045] It should be understood that terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms "a", "an" and "the" may also be meant to include the plural forms unless the context clearly dictates otherwise. The terms "comprising", "comprising", "containing" and "having" are inclusive and thus indicate the presence of stated fea...

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Abstract

The invention relates to the technical field of extreme ultraviolet lithography, in particular to a testing device of a dynamic gas lock and a testing method using the same. The testing device of the dynamic gas lock comprises a vacuum chamber system, a clean gas system, a polluted gas system, a gas analysis system, a vacuumizing pump set and a controller, wherein the controller controls the dynamic gas lock to introduce cleaning gas into a low cleaning chamber and a high cleaning chamber, and introduces polluted gas into the low cleaning chamber, so that the state of the gas lock in use can be simulated, and then the inhibition effect of the dynamic gas lock on the polluted gas in the low cleaning chamber is tested according to the gas analysis system; therefore, the dynamic gas lock performance can be comprehensively tested and evaluated.

Description

technical field [0001] The invention relates to the technical field of extreme ultraviolet lithography, in particular to a testing device for a dynamic gas lock and a testing method using the same. Background technique [0002] Extreme ultraviolet lithography is the mainstream lithography technology for 7nm and below nodes. Extreme ultraviolet lithography uses extreme ultraviolet light with a wavelength of 13.5nm. Since air and almost all refractive optical materials have a strong absorption effect on the extreme ultraviolet radiation with a wavelength of 13.5nm, the interior of the extreme ultraviolet lithography machine needs to be set as a vacuum environment. The extreme ultraviolet illumination optical system, imaging optical system, mask table and workpiece table and other component systems are all placed in corresponding vacuum chambers. [0003] According to the functional requirements, each component of the extreme ultraviolet lithography machine has different requ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N33/00
CPCG01N33/0004
Inventor 王魁波吴晓斌谢婉露罗艳沙鹏飞韩晓泉李慧
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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