Full-automatic silicon ring flatness light sensation detection method and device

Abstract

The invention discloses a full-automatic silicon ring flatness light sensation detection method and device. The method comprises the steps that sorting equipment sorts the silicon rings to a clamping component arranged on a conveying belt, and the conveying belt conveys the silicon rings to a flatness detection area and stops conveying; image acquisition and infrared distance measurement equipment arranged on each side of the conveyor belt respectively acquires a ring surface image of a silicon ring surface on one side and sends the ring surface image to a processor; the processor divides the ring surface image into a plurality of distance measurement areas, determines a plurality of infrared distance measurement points in each distance measurement area, and generates a distance measurement signal containing infrared distance measurement positioning information; the image acquisition and infrared distance measurement equipment performs infrared distance measurement after positioning the infrared distance measurement areas and the distance measurement points according to the distance measurement signal, and sends distance measurement data to the processor; and the processor calculates the flatness grade of the silicon rings and generates a grading signal, and the sorting equipment sorts the silicon rings to the designated recovery equipment according to the sorting signal. According to the full-automatic silicon ring flatness light sensation detection method and the device, and streamlined and full-automatic detection of the flatness of the silicon rings is realized.

Description

technical field

[0001] The invention relates to the technical field of silicon ring flatness detection technology, in particular to a fully automatic silicon ring flatness photosensitive detection method and device. Background technique

[0002] Silicon ring is an auxiliary material in the manufacturing process of integrated circuits. It is mainly used in the ion implantation process to support and fix silicon wafers. The flatness of the silicon ring surface will directly affect the precision of the subsequent semiconductor manufacturing process. At present, naked eyes or microscopes are generally used to test the flatness of silicon rings. This traditional manual detection method is inefficient and highly dependent on the testing experience of the testing personnel. It is difficult to guarantee the accuracy of the testing results. Semiconductor manufacturing companies urgently need a A fully automatic silicon ring flatness detection device is installed to realize the strea...

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