A device and method for measuring the influence of ion density on relative permittivity

Abstract

The invention discloses a device and a measurement method for measuring the influence of ion density on relative permittivity, including a main control device, a hollow cavity structure, a radio frequency transceiver device, an electrical control device, and a vacuum control device. And the electrical control device is connected, the vacuum control device, the radio frequency transceiver device, and the electrical control device are respectively connected with the hollow cavity structure; the vacuum control device and the electrical control device receive the control signal of the main control device, change the internal state of the hollow cavity, and transmit and receive through radio frequency The device detects the plasma signal power under different ion density states, calculates the relative permittivity, and analyzes the influence of different ion densities on the phase of the incident signal; The dielectric constant is taken into account, which solves the problem of not being able to measure the effect of ion density on the plasma dielectric constant.

Description

technical field [0001] The invention relates to the technical field of detection of factors affecting the dielectric constant by substances, in particular to a device and a measurement method for measuring the influence of ion density on the relative dielectric constant. Background technique [0002] Plasma, also known as plasma, is an ionized gas-like substance composed of positive and negative ions generated after ionization of atoms and atomic groups after partial electron deprivation. It is a macroscopically neutral ionized gas whose scale is larger than the Debye length. Movement is dominated by electromagnetic forces and exhibits remarkable collective behavior. In low-frequency electromagnetic fields, the plasma behaves as a conductor; when the frequency of the applied electromagnetic field is high enough, the plasma behaves more like a dielectric. [0003] The dielectric constant is the most basic parameter to characterize the dielectric. It is a parameter to measur...

AI Technical Summary

Problems solved by technology

[0004] For most plasma sources, the plasma is generated by colliding electrons and neutral gas by means of an external electric field. In this process, the ion density cannot be precisely controlled.

Therefore, in the process of plasma diagnosis, the influence of ion density on plasma dielectric constant cannot be ignored, let alone the influence of ion density on plasma dielectric constant cannot be measured

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