Device and method for measuring influence of ion density on relative dielectric constant

Abstract

The invention discloses a device and method for measuring the influence of ion density on relative dielectric constant. The device comprises a main control device, a hollow cavity structure, a radio frequency transceiver, an electrical control device and a vacuum control device. The main control device is connected with the vacuum control device and the electrical control device. The vacuum control device, the radio frequency transceiver and the electrical control device are respectively connected with the hollow cavity structure. The vacuum control device and the electrical control device receive control signals of the main control device, change the internal state of the hollow cavity, detect plasma signal power in different ion density states through the radio frequency transceiver, calculate relative dielectric constants and analyze the influence of different ion densities on incident signal phases. The plasma density is accurately controlled. In plasma diagnosis, the influence of the ion density on the plasma dielectric constant is considered, and the problem that the influence of the ion density on the plasma dielectric constant cannot be measured is solved.

Description

technical field [0001] The invention relates to the technical field of detection of factors affecting the dielectric constant by substances, in particular to a device and a measurement method for measuring the influence of ion density on the relative dielectric constant. Background technique [0002] Plasma, also known as plasma, is an ionized gas-like substance composed of positive and negative ions generated after ionization of atoms and atomic groups after partial electron deprivation. It is a macroscopically neutral ionized gas whose scale is larger than the Debye length. Movement is dominated by electromagnetic forces and exhibits remarkable collective behavior. In low-frequency electromagnetic fields, the plasma behaves as a conductor; when the frequency of the applied electromagnetic field is high enough, the plasma behaves more like a dielectric. [0003] The dielectric constant is the most basic parameter to characterize the dielectric. It is a parameter to measur...

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Problems solved by technology

[0004] For most plasma sources, the plasma is generated by colliding electrons and neutral gas by means of an external electric field. In this process, the ion density cannot be precisely controlled.

Therefore, in the process of plasma diagnosis, the influence of ion density on plasma dielectric constant cannot be ignored, let alone the influence of ion density on plasma dielectric constant cannot be measured

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