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Evaporation support plate, evaporation device and evaporation method

A technology of evaporation and carrier plate, which is applied in the directions of vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of mask plate deformation and affecting the evaporation effect, etc., to improve the precision and improve the evaporation efficiency. The effect of yield

Active Publication Date: 2021-09-03
BOE TECH GRP CO LTD +1
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Problems solved by technology

[0003] In view of this, an embodiment of the present invention provides an evaporation carrier, an evaporation device, and an evaporation method, which solve the problem that the deformation of the mask plate under high temperature conditions affects the evaporation effect

Method used

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  • Evaporation support plate, evaporation device and evaporation method
  • Evaporation support plate, evaporation device and evaporation method
  • Evaporation support plate, evaporation device and evaporation method

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specific Embodiment approach

[0030] Before entering the vapor deposition machine, the mask plate 3 in the normal temperature state is square, such as Figure 1a As shown, during evaporation, when the mask plate 3 is used for a period of time, due to the increase of the evaporation temperature, the mask plate 3 itself will expand to a certain extent, causing the diaphragm strips on the mask plate 3 to no longer be square. (Such as Figure 1b shown), the glass substrate entering the evaporation chamber at this time, such as Figure 1c As shown, if the temperature of the glass is not compensated, its deformation does not match the Mask deformation. Even if the position is matched, the evaporation offset in some areas will exceed the standard, which will lead to display defects and affect product yield. . At present, the method that the deformation of the mask plate under high temperature affects the evaporation effect is generally to compensate the expansion deformation into the netting of the mask plate 3 ...

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Abstract

The embodiment of the invention provides an evaporation support plate, an evaporation device and an evaporation method. The problem that a mask plate is deformed under the high-temperature condition and consequently the evaporation effect is affected is solved. The evaporation support plate comprises a temperature control area and a temperature sensing area, wherein the temperature sensing area is arranged at the periphery of the temperature control area and surrounds the temperature control area; and the temperature control area comprises a plurality of temperature control units, and the temperature of each temperature control unit can be independently controlled.

Description

technical field [0001] The invention relates to the technical field of evaporation, in particular to an evaporation carrier, an evaporation device and an evaporation method. Background technique [0002] In the evaporation process, the crucible responsible for evaporating organic or metal materials has a very high temperature (such as: 200 ° C ~ 1500 ° C), after the evaporation gas is evaporated on the metal mask, the metal mask will be removed from the The original room temperature (such as: 26°C) is heated to a certain temperature (such as: 40°C). During this process, the metal mask will have a certain thermal expansion and deformation, thereby affecting the evaporation effect. Contents of the invention [0003] In view of this, the embodiments of the present invention provide an evaporation carrier, an evaporation device, and an evaporation method, which solve the problem that the deformation of the mask plate under high temperature affects the evaporation effect. [0...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/04C23C14/24
CPCC23C14/541C23C14/042C23C14/24
Inventor 刘肖楠陈颖冰高翔李军张磊田杰张楠陶欢杨林
Owner BOE TECH GRP CO LTD
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