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Crucible system for growing crystals by physical vapor transport method and use method of crucible system

A technology of physical vapor transport and crystal growth, which is applied in the directions of single crystal growth, single crystal growth, crystal growth, etc. It can solve the problems of increase in theoretical analysis of the crystal growth process, loss of raw materials, blockage of temperature measurement window, etc., and achieve a stable crystal growth environment , improve crystal quality, strengthen the effect of sealing effect

Active Publication Date: 2021-11-16
ULTRATREND TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, on the one hand, during the crystal growth process using this method, the sublimation of the raw materials at high temperature will continuously produce gas phase substances and expand, and it is easy to open the crucible lid to cause a large amount of leakage and loss of raw materials.
The partially open crucible design is more likely to cause two-way pollution to the furnace cavity and raw materials
Leaked gaseous substances tend to deposit on the temperature measurement window at low temperature and cause blockage, resulting in the failure of normal operation of the equipment
On the other hand, it is difficult to ensure the air tightness in the crucible, and it is also difficult to control the mass transfer process and supersaturation distribution in the crucible, which adds obstacles to the theoretical analysis of the crystal growth process.

Method used

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  • Crucible system for growing crystals by physical vapor transport method and use method of crucible system
  • Crucible system for growing crystals by physical vapor transport method and use method of crucible system
  • Crucible system for growing crystals by physical vapor transport method and use method of crucible system

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Experimental program
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Effect test

Embodiment 1

[0027] See attached figure 1 , in the first illustrated embodiment of the present invention, the inner wall of the crucible body 2 is provided with a step surface, and the spacer 3 is placed on the step surface; the outer wall of the crucible body 2 is provided with a small step at the opening, the said The crucible cover is set on the narrowing small step. Below the spacer is a crystal growth chamber with a built-in raw material 4 , and the space between the spacer and the lower surface of the crucible lid 1 is an isolation room. The diameter of the spacer is d 3 , the crystal growth chamber diameter is d 1 , the diameter of the isolation chamber is d 2 , the step width is w 1 , the selection range of spacer diameter is d 2 3 1 ,w 1 = d 1 -d 2 .

[0028] The diameter of the spacer is selected from the above range, so that even when the spacer moves horizontally in the crucible under the action of air pressure, it can still completely cover the opening, ensuring that ...

Embodiment 2

[0030] See attached figure 2 In the second illustrated embodiment of the present invention, the inner wall of the crucible body 2 is a straight cylinder, the outer wall of the crucible body has small steps, the crucible cover 1 is built on the steps of the outer wall of the crucible body, and the spacer 3 is placed on the top of the crucible body 1 . An isolation chamber is formed between the spacer 3 and the crucible cover 1, and the entire inner range of the crucible body under the spacer 3 is a crystal growth chamber. The diameter selection of spacer is similar to embodiment 1, if the diameter of spacer 3 is d 4 , the diameter of the inner wall of the crucible body 2 is d 5 , the diameter of the inner wall of the crucible cover 1 is d 6 , the thickness of the top side wall of the crucible body 2 is w 2 , the selection range of spacer diameter is d 5 4 6 ,w 2 d 6 -d 5 .

Embodiment 3

[0032] See attached image 3 , In the third embodiment of the present invention, the inner and outer walls of the crucible body 2 are straight cylinders. In this example, an annular gasket member 5 is added and placed on the crucible body 2 . The annular gasket member 5 is a cylinder, and the cylinder contains an axial through hole. The axial through hole is composed of a large-diameter hole and a small-diameter hole. The large-diameter hole extends downward from the top of the cylinder, and the small-diameter hole is formed by The bottom of the cylinder extends upwards and connects with the large-diameter hole, forming a stepped surface at the joint; and the outer circle of the top of the cylinder is provided with a brim. The brim of the hat is placed on the opening of the crucible body; the spacer 3 is placed on the step surface, and the crucible cover 1 is buckled on the ring gasket member. Among them, the diameter of the spacer d 7 Satisfied: D 8 7 9 ,w 3 = d 9 -d 8 ...

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Abstract

The invention discloses a crucible system for growing crystals by a physical vapor transport method and a use method of the crucible system. An internal space defined by a crucible body and a crucible cover, namely a crystal growth cavity, is divided into two independent parts by placing an isolation piece in a crucible, an isolation chamber is arranged between the upper surface of the isolation piece and the crucible cover, the upper surface of the isolation piece and the crucible cover are separated into two independent parts. and a crystal growth chamber is arranged between the lower surface of the isolation piece and the crucible bottom. In combination with the technological process of a PVT method, the growth chamber is sealed by utilizing gas-phase transmission of vacuumizing, inflating and raw material sublimation in the technological process. By using the crucible system disclosed by the invention, the leakage of raw materials and bidirectional pollution in an open crucible are greatly reduced, and a more stable crystal growth environment is created by virtue of a closed state design, so that the crystal quality is improved, and the production cost is reduced.

Description

technical field [0001] The invention relates to the technical field of crystal growth, in particular to a crucible system for growing crystals by a physical vapor transport method and an application method thereof. Background technique [0002] The physical vapor transport method is a method widely used in crystal growth, especially in the field of third-generation semiconductor crystal growth such as aluminum nitride and silicon carbide, and has now become the most mainstream method for preparing large-sized aluminum nitride and silicon carbide single crystals . In this field, the physical vapor transport method mainly heats the crucible at high temperature, the raw material is sublimated into a gas phase at high temperature, and through different thermal field designs, the gas phase is transported to a relatively low temperature growth area for deposition and continuous growth. In addition, the physical vapor transport method is also suitable for high-temperature purifica...

Claims

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Application Information

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IPC IPC(8): C30B23/00C30B29/40C30B29/36
CPCC30B23/00C30B29/403C30B29/36
Inventor 吴亮王琦琨雷丹李哲黄嘉丽张刚赵寅廷
Owner ULTRATREND TECH INC