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Mask cloth and preparation method thereof

A mask cloth and base cloth technology, applied in the field of textiles, can solve the problems of lack of beauty and auxiliary beauty effects, unfavorable facial skin absorption of the mask essence, and the mask cloth being difficult to meet market demand, etc. Conducive to absorption and improving elasticity

Pending Publication Date: 2021-11-26
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The mask cloth in the prior art has a single function and does not have the effect of beautifying and assisting beautifying
In winter, due to the low ambient temperature, the face mask is cooler when applied on the face, resulting in a poor experience when applying the mask
In addition, the low ambient temperature will shrink the skin pores, which is not conducive to the facial skin absorbing the essence on the mask
[0004] As consumers have higher and higher requirements for skin care products, the common mask cloth in the prior art has been difficult to meet the market demand

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Mask cloth and preparation method thereof
  • Mask cloth and preparation method thereof

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Embodiment Construction

[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0033] The facial mask cloth of this embodiment includes a base cloth, and the base cloth includes a plurality of silk fibers intertwined with each other, and any one of the silk fibers is attached with phase-change microcapsule particles, and the phase-change microcapsule particles are composed of core material and The core material is composed of a wall material covering the outside of the core material, the core material includes octadecane, the wall materia...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention discloses mask cloth and a preparation method thereof. The mask cloth comprises base cloth; the base cloth comprises a plurality of silk fibers woven and wound with each other; phase change microcapsule particles are attached to any one of the silk fibers; and the phase change temperature of the phase change microcapsule particles is 20-25 DEG C. The temperature of the mask cloth can be maintained at 25 DEG C, so that the facial skin can obtain a relatively comfortable temperature when being in contact with the mask, the skin pores are opened, and the absorption of mask essence is facilitated.

Description

technical field [0001] The invention relates to the technical field of textiles, in particular to a mask cloth and a preparation method thereof. Background technique [0002] Facial mask is a commonly used and popular cosmetic and skin care product. Facial masks generally include facial mask cloth and facial mask essence carried in the facial mask cloth. Because facial mask cloth is in direct contact with human skin, therefore, facial mask cloth also can produce certain effect to the cosmetic efficacy of human skin. [0003] The facial mask cloth in the prior art has a single function and does not have the effect of beautifying and assisting beautifying. In winter, due to the low ambient temperature, the facial mask is relatively cool when applied on the face, resulting in a poor experience when applying the facial mask. In addition, the low ambient temperature will shrink the pores of the skin, which is not conducive to the absorption of the essence on the mask by the fa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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IPC IPC(8): D04H1/413D04H1/42D04H1/492D04H1/498A61K9/70
CPCD04H1/413D04H1/42D04H1/492D04H1/498A61K9/70
Inventor 王萍宋雪旸邹婷张岩李媛媛徐岚刘福娟
Owner SUZHOU UNIV
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