Irradiation device and system convenient for air removal
A technology of air removal and irradiation device, which is applied to the device for coating liquid on the surface, pretreatment surface, coating, etc. It can solve the problems of long time and low efficiency of air removal, and achieve the effect of reducing time consumption and use.
Active Publication Date: 2021-12-28
常熟五临天光电科技有限公司
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Problems solved by technology
[0005] The purpose of the embodiments of the present invention is to provide an irradiation device that facilitates air removal, aiming to solve the problems of long time-consuming and low efficiency of air removal in existing irradiation devices
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[0017] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0018] The specific implementation of the present invention will be described in detail below in conjunction with specific embodiments.
[0019] Such as figure 1 As shown, it is a structural diagram of an irradiation device that facilitates air removal provided by an embodiment of the present invention, and the irradiation device that facilitates air removal includes a housing 1 and a partition 4 disposed in the housing 1;
[0020] The partition 4 divides the space in the housing 1 into a first chamber and a second chamber;
[0021] A casing 2 is arranged in the first chamber, and a buffer cavity...
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The invention relates to the semiconductor industry, in particular to an irradiation device and system convenient for air removal. The device comprises a shell and an interlayer arranged in the shell; the space in the shell is divided into a first cavity and a second cavity by the interlayer; a shell is arranged in the first cavity, a buffer storage cavity is formed between the shell and the interlayer, the buffer storage cavity is provided with an air inlet, and the air inlet is connected with an air source through an air inlet pipe; an air outlet and a coanda hole which are communicated with the buffer cavity and the second cavity are arranged on the interlayer; and the second cavity is communicated with the outside, and a lamp tube is arranged in the second cavity. According to the irradiation device convenient for air removal provided by the invention, the first cavity and the second cavity are arranged, and the buffer cavity is arranged in the first cavity, so that the influence of the external environment on the buffer cavity can be reduced, air in the buffer cavity can be conveniently exhausted, the use of inert gas is reduced, the time consumed for air exhaust is shortened, and the irradiation device is efficient and reliable.
Description
technical field [0001] The invention relates to the semiconductor industry, in particular to an irradiation device and system for facilitating air removal. Background technique [0002] In the production process of semiconductors, display modules, high-grade flooring, etc., adhesives are often used for bonding. The general adhesive cures faster, the window time of the bonding operation is short, it is inconvenient to adjust during the bonding process, and the applicability is poor. [0003] Light-curing adhesives solve this problem. The light-curing adhesive is to first apply the liquid adhesive to the surface to be bonded, and then use a specific light to irradiate the adhesive to make the adhesive react and achieve bonding. This method is suitable for assembly line operations. Good bonding effect and high stability. [0004] When using light to irradiate the adhesive, it is usually necessary to use an inert gas for protection to prevent the active gas in the air from pa...
Claims
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IPC IPC(8): B05D3/06
CPCB05D3/06
Inventor 李宏伟
Owner 常熟五临天光电科技有限公司