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Advanced intelligent device control system for ion implanter

An ion implanter and intelligent equipment technology, applied in the field of advanced intelligent equipment control system, can solve the problems of affecting consistency, loss of production capacity, and time-consuming, saving manpower, increasing machine production time, and saving round trips effect of time

Inactive Publication Date: 2022-01-04
SHANGHAI GLORYSOFT CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The ion implanter needs to adjust the ion beam beam in response to the needs of different products. Generally, when the adjustment is performed, it is necessary to manually assist the machine to define, then the machine performs automatic adjustment, and finally executes the machine test. Confirmation, the adjustment process takes a lot of time, resulting in loss of production capacity
[0003] There are many variables that affect the output process level of ion implantation machines, including the capacity of the previous process machine, the status of the machine equipment at the current station, and the process parameters at the current station. When operating manually, it is easy to cause errors and omissions or affect consistency when considering variables. sex

Method used

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  • Advanced intelligent device control system for ion implanter
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Embodiment Construction

[0024] The specific implementation manners of the present invention will be described below in conjunction with the accompanying drawings.

[0025] The advanced intelligent equipment control system for ion implanters includes: remote control module, data acquisition module, analytical feedback module and intelligent adjustment module.

[0026] Remote control module, remotely control the machine through RCM.

[0027] The data acquisition module collects the parameters and status parameters of the machine equipment on the current layer and the front layer, and collects the process parameters of the current layer and the front layer at the same time. The data acquisition module has OCR to assist image recognition and collect information and data.

[0028] Analyze the feedback module, adjust the feedback equation, and feed back the received adjustment mode information to the remote control module. In the initial stage of parameter adjustment of the analytical feedback module, th...

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Abstract

The invention provides an advanced intelligent device control system for an ion implanter, and the system is characterized in that the system comprises a remote control module which remotely controls a machine through an RCM, a data acquisition module which is used for collecting parameters and state parameters of current-layer and previous-layer machine equipment and collecting current-layer and previous-layer process parameters at the same time, an analysis feedback module which is used for adjusting a feedback equation and feeding back the received adjustment mode information to the remote control module, and an intelligent adjustment module which is used for analyzing current-layer and previous-layer machine equipment parameters and process parameters by utilizing iDEP, drawing up an algorithm, finding out key factors and then feeding back an adjustment mode to the analysis feedback module. Labor can be saved, and the production time of a machine can be prolonged.

Description

technical field [0001] The invention relates to an advanced intelligent device control system for an ion implanter, belonging to the field of chip manufacturing. Background technique [0002] The ion implantation machine needs to adjust the ion beam beam according to the needs of different products. Generally, when the adjustment is performed, it is necessary to manually assist the machine to define, then the machine performs automatic adjustment, and finally executes the machine test. Confirm that the adjustment process takes a lot of time, resulting in loss of production capacity. [0003] There are many variables that affect the output process level of ion implantation machines, including the capacity of the previous process machine, the status of the machine equipment at the current station, and the process parameters at the current station. When operating manually, it is easy to cause errors or omissions or the same impact when considering the variables. sex. Content...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B19/414H01J37/304H01J37/317
CPCG05B19/414H01J37/3171H01J37/304
Inventor 曾子明
Owner SHANGHAI GLORYSOFT CO LTD
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