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A multi-wavelength wave locker based on photothermorefractive glass and its preparation method

A wave locker and multi-wavelength technology, which is applied in the field of multi-wavelength wave locker and its preparation based on photothermorefractive glass, can solve the problems of wavelength locking and narrowing of spectral bandwidth that cannot be used for multiple wavelengths

Active Publication Date: 2022-04-01
杭州拓致光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of the above-mentioned deficiencies in the prior art, the purpose of the present invention is to provide a multi-wavelength wave locker based on photothermorefractive glass and its preparation method, aiming to solve the problem that the wavelength locker cannot realize the wavelength of light of various wavelengths. Locking and spectral bandwidth narrowing, making it suitable for the application requirements of different scenarios of semiconductor lasers

Method used

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  • A multi-wavelength wave locker based on photothermorefractive glass and its preparation method
  • A multi-wavelength wave locker based on photothermorefractive glass and its preparation method
  • A multi-wavelength wave locker based on photothermorefractive glass and its preparation method

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Embodiment 1

[0039] Taking the preparation of a four-channel wave-locked device as an example to describe its manufacturing process, the specific steps are as follows:

[0040] 1. When the number of central wavelengths required by the multi-wavelength wave locker is 4, and each central wavelength is λ 1 =975nm, λ 2 =976nm, λ 3 =977nm and λ 4 =978nm, according to the grating equation θ=arcsin(n av lambda e / λ c ), where λ e =325nm is the wavelength of ultraviolet light used for exposure, λ c is the above center wavelength, n av is the average refractive index of the photothermorefractive glass, and the corresponding exposure angles are calculated as: θ 1 =29.90742°, θ 2 = 29.87366°, θ 3 = 29.83998°, θ 4 = 29.80638°;

[0041] 2. Use the interference fringes formed by double beams of ultraviolet parallel light, and the exposure amount is 50mJ to expose the photothermorefractive glass, and the exposure angle is θ 1 , then the corresponding central wavelength is λ 1 =975nm;

[00...

Embodiment 2

[0047] Taking the preparation of a four-channel wave-locked device as an example to describe its manufacturing process, the specific steps are as follows:

[0048] 1. When the number of central wavelengths required by the multi-wavelength wave locker is 4, and each central wavelength is λ 1 =975nm, λ 2 =976nm, λ 3 =977nm and λ 4 =978nm, according to the grating equation θ=arcsin(n av lambda e / λ c ), where λ e =325nm is the wavelength of ultraviolet light used for exposure, λ c is the above center wavelength, n av is the average refractive index of the photothermorefractive glass, and the corresponding exposure angles are calculated as: θ 1 =29.90742°, θ 2 = 29.87366°, θ 3 = 29.83998°, θ 4 = 29.80638°;

[0049] 2. Use the interference fringes formed by double beams of ultraviolet parallel light, and the exposure amount is 40mJ to expose the photothermorefractive glass, and the exposure angle is θ 1 , then the corresponding central wavelength is λ 1 =975nm;

[00...

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Abstract

The invention discloses a multi-wavelength wave locker based on photothermorefractive glass and a preparation method thereof, wherein the method includes the steps of: adopting the interference fringes formed by double beams of ultraviolet parallel light and the influence of the first exposure on the photothermal refraction The glass is exposed, and the exposure angle is θ 1 , then the period corresponding to the written grating is Λ 1 , the corresponding center wavelength is λ 1 ; Adjust the exposure angle to θ 2 , using the second exposure amount to expose the photothermorefractive glass, then the period corresponding to the writing grating is Λ 2 , the corresponding center wavelength is λ 2 ;Sequentially adjust the exposure angle to θ n , using the nth exposure to expose the photothermorefractive glass, then the period corresponding to the writing grating is Λ n , the corresponding center wavelength is λ n Carry out thermal development on the exposed photothermorefractive glass, then cut and finely polish it, and finally coat the photothermorefractive glass with an anti-reflection film to achieve wavelength locking of semiconductor lasers with multiple wavelengths at the same time. and a multi-wavelength locker with spectral bandwidth narrowing.

Description

technical field [0001] The invention relates to the technical field of wavelength lockers, in particular to a multi-wavelength wave locker based on photothermorefractive glass and a preparation method thereof. Background technique [0002] Semiconductor lasers have the advantages of high efficiency, long life, and easy integration, and have been widely used in laser communication, laser printing, ranging, and pumping sources. However, the output spectral linewidth of semiconductor lasers is relatively wide, and the central wavelength will drift with temperature changes. Therefore, most of the industry currently uses reflective volume gratings as wave-locking devices to lock the wavelength and narrow the spectral bandwidth of the semiconductor laser spectrum. [0003] The patent with the publication number CN110879433B discloses a method for preparing a reflective volume grating based on photothermorefractive glass. It specifically introduces the preparation method of a refle...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/06G02B5/18
CPCH01S5/06G02B5/1857
Inventor 胡红雷晋帅宋学智嵇舒豪
Owner 杭州拓致光电科技有限公司
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