Sodium-sulfur battery sulfur electrode current collector max phase multi-layer composite protective coating and preparation method thereof
A sodium-sulfur battery and protective coating technology, which is applied to battery electrodes, electrode carriers/current collectors, coatings, etc., can solve the problems of corrosion resistance, electrical conductivity and thermal conductivity, etc., to improve corrosion resistance, Addresses the effects of reduced strength, good electrical and thermal conductivity
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[0029] A preparation method of a MAX phase multilayer composite protective coating for a sulfur electrode current collector of a sodium-sulfur battery, comprising the following steps:
[0030] (1) Sandpaper the surface of the current collector, ultrasonically clean it with acetone and alcohol successively, and then dry it for use;
[0031] (2) Place the dried current collector in step (1) in a magnetron sputtering equipment, first heat the current collector, sputter the sulfur electrode current collector under the protection of inert gas, and deposit Cr on the surface of the current collector 2 AlC coating;
[0032] (3) In the above deposition system, turn off the Al target and keep the Cr target and C 2 H 2 of continuous access, continued sputtering, in Cr 2A layer of Cr is deposited on the AlC coating 3 C 2 coating to obtain Cr on the surface of the current collector 2 AlC / Cr 3 C 2 composite coating;
[0033] (4) Repeat the above steps (2) to (3) to obtain alternati...
Embodiment 1
[0046] (1) The surface of the stainless steel substrate (20×10×5mm) is polished with 280-mesh to 1200-mesh sandpaper in turn, then ultrasonically cleaned with acetone and alcohol, and then dried for use.
[0047] (2) Put the dry stainless steel substrate into the cavity of the magnetron sputtering apparatus, and evacuate the cavity of the magnetron sputtering apparatus to 6×10 -4 Pa, then the stainless steel substrate was heated to 550°C.
[0048] (3) Ar gas was introduced into the cavity (the flow rate of Ar gas was 20 sccm), and sputtered for 10 minutes to remove the oxide on the surface of the target material and achieve the purpose of cleaning the target material.
[0049] (4) Then enter C 2 H 2 gas, keep Ar and C 2 H 2 Gas ratio (Ar:C 2 H 2 =20 sccm:1 sccm), the working pressure is 0.5Pa, the target shutter is opened, the Cr target power is set to 60W (current is 0.24A, voltage is 250V), and the Al target power is set to 30W (current is 0.1A, The voltage is 300V), ...
Embodiment 2
[0054] (1) The surface of the stainless steel substrate (20×10×5mm) is polished with 280-mesh to 1200-mesh sandpaper in turn, then ultrasonically cleaned with acetone and alcohol, and then dried for use.
[0055] (2) Put the dry stainless steel substrate into the cavity of the magnetron sputtering apparatus, and evacuate the cavity of the magnetron sputtering apparatus to 6×10 -4 Pa, then the stainless steel substrate was heated to 550°C.
[0056] (3) Ar gas was introduced into the cavity (the flow rate of Ar gas was 20 sccm), and sputtered for 10 minutes to remove the oxide on the surface of the target material and achieve the purpose of cleaning the target material.
[0057] (4) Then enter C 2 H 2 gas, keep Ar and C 2 H 2 Gas ratio (Ar:C 2 H 2 =20 sccm:1 sccm), the working pressure is 0.5Pa, the target shutter is opened, the Cr target power is set to 60W (current is 0.24A, voltage is 250V), and the Al target power is set to 30W (current is 0.1A, The voltage is 300V), ...
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