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Cleaning equipment

A technology for cleaning equipment and equipment, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as reducing the exhaust effect, damage to workpieces, and hindering the flow of air inside the cleaning equipment, so as to reduce The effect of maintenance costs

Active Publication Date: 2022-04-12
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, during the cleaning process, the exhaust equipment inside the cleaning equipment will be continuously opened to form an air flow parallel to the notch of the acid tank 02 to discharge the acid gas inside the cleaning equipment. figure 1 As shown, when the slot cover 04 is opened, it will hinder the air flow inside the cleaning equipment and reduce the exhaust effect; Interference with it during movement, resulting in damage to the workpiece

Method used

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Embodiment Construction

[0036] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the cleaning equipment provided by the present invention will be described in detail below in conjunction with the accompanying drawings.

[0037] Please refer to figure 2 and image 3 , this embodiment provides a cleaning device, which includes a cavity 1 , a process tank 2 and an opening and closing device 3 . Wherein, the process tank 2 is arranged in the cavity 1, and is used for containing cleaning liquid. Specifically, the process tank 2 is, for example, an acid tank for containing acid liquid, and since the acid liquid is easy to volatilize, an opening and closing device 3 for controlling the opening and closing of the notch must be provided on the acid tank.

[0038] Such as image 3 As shown, the opening and closing device 3 includes a flexible film 33 , a first reel assembly 31 and a second reel assembly 32 . Wherein, the flexible film 33 cov...

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Abstract

The invention provides cleaning equipment which comprises a cavity, a process tank and an opening and closing device, and the process tank is arranged in the cavity and used for containing cleaning fluid; the opening and closing device comprises a flexible film, a first reel assembly and a second reel assembly. Wherein the flexible film covers a groove opening of the process groove and is provided with an opening part and a shielding part which are matched with the groove opening of the process groove; the two ends of the flexible film are wound on the first reel assembly and the second reel assembly respectively, and the first reel assembly and the second reel assembly can synchronously rotate in the same direction to drive the flexible film to move, so that the opening part and the shielding part selectively open or shield the groove opening of the process groove. According to the cleaning equipment provided by the invention, flowing of air flow in the cavity can be effectively prevented from being hindered, and the opening and closing device in the cleaning equipment cannot interfere with a manipulator in the cleaning equipment.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a cleaning device. Background technique [0002] In the semiconductor manufacturing process, vertical furnaces are usually used to oxidize, diffuse and anneal wafers. A vertical furnace is usually provided with a quartz tube and a quartz boat. The quartz boat is used to carry a wafer and can carry the wafer into the quartz tube for processing. During the process, the quartz tube and the quartz boat are in direct contact with the wafer, so the cleanliness of the quartz tube and the quartz boat will affect the process effect of the wafer. In order to ensure the process effect, cleaning equipment is usually used to periodically clean the quartz tube and quartz boat to ensure cleanliness. [0003] Such as figure 1 As shown, the traditional horizontal cleaning equipment usually includes a plurality of water tanks 01 and acid tanks 02 arranged side by side, and the quartz ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/04B08B3/08B08B13/00
CPCY02P70/50
Inventor 高广新张敬博李广义王广永王延广
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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