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Cleaning device of reaction furnace and reaction furnace

A technology for cleaning devices and reaction furnaces, which can be used in cleaning methods using liquids, removing smoke and dust, cleaning hollow objects, etc., which can solve the problems of furnace tube equipment downtime, affecting production processes, and reducing the performance of reaction furnaces, so as to improve the cleaning effect. , the effect of improving safety

Active Publication Date: 2022-04-12
CHANGXIN MEMORY TECH INC
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the process of the reaction furnace of the furnace tube equipment, the internal materials undergo a chemical reaction to form by-products such as fins or particles. The by-products will adhere to the inner wall of the reaction furnace and reduce the performance of the reaction furnace. It may cause the downtime of the furnace tube equipment, affect the production process, and cause economic losses to the manufacturer

Method used

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  • Cleaning device of reaction furnace and reaction furnace
  • Cleaning device of reaction furnace and reaction furnace
  • Cleaning device of reaction furnace and reaction furnace

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Embodiment Construction

[0049] In order to make the purpose, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions in the disclosed embodiments will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present disclosure. Obviously, the described embodiments It is a part of the embodiments of the present disclosure, but not all of them. Based on the embodiments in the present disclosure, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present disclosure. It should be noted that, in the case of no conflict, the embodiments in the present disclosure and the features in the embodiments can be combined arbitrarily with each other.

[0050] In the related art, when the reaction furnace of the furnace tube equipment is in the process, such as preparing a wafer, the by-products such as fins or colloidal partic...

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Abstract

The invention provides a cleaning device of a reaction furnace and the reaction furnace. The cleaning device of the reaction furnace comprises a cleaning part, a supporting part and a driving part, the cleaning part is arranged to be in contact with the inner wall of the reaction furnace, the supporting part is arranged in the reaction furnace, and the cleaning part is installed on the supporting part; the driving part is arranged on the side, away from the cleaning part, of the supporting part and fixedly connected with the first end of the supporting part. Wherein the driving part is arranged to drive the supporting part to rotate, and the supporting part drives the cleaning part to move relative to the inner wall of the reaction furnace. The cleaning part makes contact with the inner wall of the reaction furnace and is driven by the driving part, so that the cleaning part can move relative to the inner wall of the reaction furnace, the automatic cleaning effect is achieved, manual cleaning is not needed, and the safety in the cleaning process is improved; and automatic cleaning is achieved, the cleaning strength can be controlled, and the cleaning effect is improved.

Description

technical field [0001] The present disclosure relates to the technical field of semiconductors, in particular to a cleaning device for a reaction furnace and a reaction furnace. Background technique [0002] In the semiconductor manufacturing process, furnace tube equipment is usually equipped to facilitate the preparation of semiconductor products. Wherein, the furnace tube equipment includes, for example, a reaction furnace. During the process of the reaction furnace of the furnace tube equipment, the internal materials undergo a chemical reaction to form by-products such as fins or particles. The by-products will adhere to the inner wall of the reaction furnace and reduce the performance of the reaction furnace. It may cause the downtime of the furnace tube equipment, affect the production process, and cause economic losses to the manufacturer. Contents of the invention [0003] The following is an overview of the subject matter described in detail in this disclosure....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B9/087B08B15/04B08B9/093B08B3/08B08B13/00H01L21/67
CPCB08B3/08B08B9/087B08B9/093B08B15/04B08B13/00H01L21/67
Inventor 陈涛
Owner CHANGXIN MEMORY TECH INC
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