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Thin liquid medicine supply device

A supply device and liquid medicine technology, applied in liquid cleaning methods, water/sludge/sewage treatment, cleaning methods and appliances, etc., can solve problems such as irregular and variable flow of dilute liquid medicines, and reduce ultra-pure water effect

Pending Publication Date: 2022-04-15
KURITA INDUSTRIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In this case, if the flow rate of ultrapure water is constant, the injection can easily reach the desired solute concentration. In the cleaning machine, since the supply and stop of the water poured on the wafer is controlled by the opening and closing of multiple valves, the flow rate of the dilute chemical solution fluctuates irregularly

Method used

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Experimental program
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Effect test

no. 1 approach ＞

[0037] [Dilute chemical solution supply device]

[0038] figure 1 It is the dilute chemical solution supply device which shows the 1st Embodiment of this invention. exist figure 1 Among them, the diluted chemical solution supply device 1 includes: a diluted chemical solution preparation unit 2 for preparing a diluted chemical solution W1; a storage tank 3 for the prepared diluted chemical solution; and the diluted chemical solution W1 stored in the storage tank 3 is used as cleaning water W2 , to the dilute chemical liquid adjustment supply mechanism 4 that is supplied to multiple sheet-fed cleaning machines 5A, 5B, and 5C as points of use; The remaining water of the machine is returned to the return mechanism of the storage tank 3.

[0039] (Dilute liquid preparation department)

[0040] The diluted chemical solution preparation unit 2 has a diluted chemical solution preparation channel 21 connecting a supply source 22 of ultrapure water (DIW) W to the storage tank 3 , an...

no. 2 approach ＞

[0067] Next, based on Figure 4 A dilute chemical solution supply device according to a second embodiment of the present invention will be described. The dilute chemical solution supply device of this embodiment basically has the same configuration as that of the above-mentioned first embodiment, and therefore the same reference numerals are assigned to the same configurations, and detailed description thereof will be omitted.

[0068] exist Figure 4 Among them, the dilute chemical solution supply device is configured such that two storage tanks 3A and 3B are arranged in parallel, the branch pipe 21A of the dilute chemical solution preparation flow path 21 having an on-off valve 21B is connected to the storage tank 3B, and the return flow path is connected to the storage tank 3B. The branch pipe 51A of 51 is connected to the storage tank 3B, and further, switching valves 41A and 41B are respectively provided on the dilute chemical solution supply flow path 41 .

[0069] As ...

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Abstract

A thin liquid medicine supply device (1) is provided with: a thin liquid medicine preparation unit (2) for preparing a thin liquid medicine (W1); a storage tank (3) for the prepared diluted liquid medicine; a thin chemical solution adjusting and supplying mechanism (4) for supplying the thin chemical solution (W1) stored in the storage tank (3) as cleaning water (W2) to a plurality of single-sheet type cleaning machines (5A, 5B, 5C); and returning mechanisms which are respectively connected with the single-sheet type cleaning machines (5A, 5B, 5C) and enable the residual water of the single-sheet type cleaning machines to flow back to the storage tank (3). According to the thin liquid medicine supply device, the solute concentration of the thin liquid medicine can be adjusted with high precision, discharge of residual water can be inhibited, and the thin liquid medicine supply device is suitable for cleaning of wafers and the like.

Description

technical field [0001] The present invention relates to a dilute chemical solution supply device capable of stably and efficiently supplying a dilute chemical solution containing solutes such as alkali, oxidizing agent, and gas which are effective in cleaning and rinsing processes of semiconductor wafers and the like at extremely low concentrations. Background technique [0002] In the manufacturing process of semiconductors, in the cleaning process of silicon wafers for semiconductors, etc., water obtained by dissolving solutes effective in controlling pH or redox potential at an extremely low concentration in ultrapure water (hereinafter sometimes referred to as dilute solution). The dilute chemical solution is based on ultrapure water, and acid or alkali, oxidizing agent or reducing agent may be added in order to impart liquid properties such as pH and oxidation-reduction potential suitable for the purpose of each process such as cleaning process or rinsing process. In t...

Claims

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Application Information

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IPC IPC(8): H01L21/67B08B3/02B08B3/08B08B13/00
CPCH01L21/304C02F1/00H01L21/67017G05D11/138H01L21/67253C02F1/66B01F23/483B01F2101/24B01F35/717613B01F35/2211B01F35/2112B01F35/2132H01L21/6704
Inventor 饭野秀章
Owner KURITA INDUSTRIAL CO LTD