Etching equipment for integrated circuit production

It is an etching equipment and integrated circuit technology, which is applied to the drying of printed circuits, the secondary treatment of printed circuits, and the cleaning/polishing of conductive patterns. Easy and convenient disassembly

Active Publication Date: 2022-05-27
富璟信息数字科技(深圳)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing etching machine does not have the cleaning function, but when disassembling the integrated circuit, it is easy to inhale the volatile gas of the etching solution, which will cause damage to the body, and after the integrated circuit is cleaned, it is necessar...

Method used

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  • Etching equipment for integrated circuit production
  • Etching equipment for integrated circuit production
  • Etching equipment for integrated circuit production

Examples

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Embodiment Construction

[0030] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0031] see Figure 1 to Figure 12 , the present invention provides a technical solution: an etching device for integrated circuit production, comprising a support table 1, a support frame 11 is welded to the lower end of the support table 1, a protective shell 12 is welded to the upper end of the support table 1, and the protective shell A box door 13 is installed on the side of the 12, through which the integrated circuit board can ...

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Abstract

The invention relates to the technical field of etching devices, in particular to etching equipment for integrated circuit production, which comprises a supporting table, a supporting frame is welded at the lower end of the supporting table, a protective shell is welded at the upper end of the supporting table, a box door is mounted on the side surface of the protective shell, and a turntable is arranged at the upper end of the supporting table. The device has the beneficial effects that the arranged intermittent rotating mechanism drives the turntable to intermittently rotate, so that the integrated circuit board intermittently rotates circumferentially, and the integrated circuit board sequentially rotates below the etching device main body, the cleaning mechanism and the blow-drying mechanism; the integrated circuit board stops for a period of time when being located below the etching device main body, the cleaning mechanism and the blow-drying mechanism, the etching device main body is used for etching the integrated circuit board, the cleaning mechanism is used for flushing etching liquid on the integrated circuit board, and the blow-drying mechanism is used for blow-drying water stains on the integrated circuit board.

Description

technical field [0001] The invention relates to the technical field of etching devices, in particular to an etching device used for the production of integrated circuits. Background technique [0002] An integrated circuit is a tiny electronic device or component. Integrated circuits need to be processed by an etching machine in the process of processing. Etching machines can be divided into chemical etching machines and electrolytic etching machines. In chemical etching, chemical solution is used to achieve the purpose of etching through chemical reaction. Chemical etching machine is a technology that removes materials by chemical reaction or physical impact. After the integrated circuit is processed by the etching machine, a large amount of etching liquid will adhere to its surface. These etching liquids stay on the surface of the integrated circuit for a long time, which will cause side etching and reduce the processing yield of the integrated circuit. These etching liq...

Claims

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Application Information

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IPC IPC(8): H05K3/22H05K3/26
CPCH05K3/227H05K3/26Y02P70/50
Inventor 黄磊
Owner 富璟信息数字科技(深圳)有限公司
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