Linear terahertz ellipsometer using visible light for calibration and thickness measuring method

A visible light and terahertz technology, applied in the direction of using optical devices, instruments, measuring devices, etc., to achieve the effect of low photon energy and high safety

Active Publication Date: 2022-07-12
HUAZHONG UNIV OF SCI & TECH +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Aiming at the defects of the prior art, the object of the present invention is a linear terahertz ellipsometer and thickness measurement method calibrated by visible light, aiming to solve the problem of realizing thickness measurement in the invisible terahertz band

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Linear terahertz ellipsometer using visible light for calibration and thickness measuring method
  • Linear terahertz ellipsometer using visible light for calibration and thickness measuring method
  • Linear terahertz ellipsometer using visible light for calibration and thickness measuring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0039] The invention provides a linear terahertz ellipsometer calibrated by visible light, firstly uses terahertz wave to measure sample thickness, builds linear terahertz measurement ellipsometer, and uses visible light precision calibration system synchronously. It includes a terahertz wave emission module, a visible light emission module, a collimating lens, a silicon wafer, a wave plate, a first...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a linear terahertz ellipsometer using visible light for calibration and a thickness measurement method, and belongs to the technical field of ellipsometry thickness measurement. A linear system is designed by using a terahertz Gaussian beam and an ellipsometry thickness measurement method, and the system is calibrated by using visible light, so that the positions of a reflector and a sample table can be conveniently adjusted, and the defect that terahertz waves are invisible and difficult to adjust is overcome.

Description

technical field [0001] The invention belongs to the technical field of ellipsometry thickness measurement, and more particularly relates to a linear terahertz ellipsometer calibrated by visible light and a thickness measurement method. Background technique [0002] Thin-film technology is used in various scientific fields, especially in contemporary vacuum technology and materials science research. The film thickness is an important parameter of the physical properties of the film, and plays a certain role in the mechanical properties, optical properties, and electromagnetic properties of the film. As a result, there is an increasing demand for accurate measurement of film thickness in the moulding process. At present, the measurement methods of film thickness include ellipsometry, heterodyne interferometry, equal thickness interferometry, reflection spectroscopy, transmission spectroscopy and other measurement methods. [0003] Ellipsometry is a superior optical method fo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/06G01N21/21G01N21/01
CPCG01B11/06G01N21/211G01N21/01
Inventor 涂思语杨超刘德峰黄倩刘伟王可嘉于淼
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap