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Electronic photoetching equipment with pattern emitter

A lithography equipment and emitter technology, applied in microlithography exposure equipment, nanotechnology for information processing, circuits, etc., can solve the problems of complex structure of lithography equipment, sensitivity to air pollution, and inability to commercialize applications.

Inactive Publication Date: 2005-10-12
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, the structure of the lithography equipment is complicated
[0004] At the same time, photocathode emission lithography using large-scale electron sources is very sensitive to air pollution and thus cannot be commercially applied.

Method used

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  • Electronic photoetching equipment with pattern emitter
  • Electronic photoetching equipment with pattern emitter
  • Electronic photoetching equipment with pattern emitter

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Embodiment Construction

[0030] The present invention will now be described more fully with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. Features such as shapes and thicknesses of elements shown in the drawings will be exaggerated for clarity. The same reference numerals in different drawings denote the same elements.

[0031] figure 1 is a schematic cross-sectional view of an electrolithographic apparatus for providing one-to-one projection of patterns according to an embodiment of the present invention. see figure 1 , the substrate 20 coated with the electronic resist 24 is placed on the substrate holder 22 . The thermoelectric emitter 10 is mounted on an emitter holder 12 at a predetermined distance from a substrate 20 and emits an electron beam 17 when it is heated by an external heat source 18 . The emitter 10 includes a thermoelectric plate 11 , a dielectric layer 16 formed on the thermoelectric plate 11 with a predetermined pattern, and ...

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Abstract

An electron beam lithography apparatus, which uses a patterned emitter, includes a pyroelectric plate emitter that emits electrons using a patterned metal thin layer formed on the pyroelectric plate as a mask. When the emitter is heated, electrons are emitted from portions of the emitter covered with a patterned dielectric layer, and not from portions of the emitter covered with a patterned metal thin layer, and a pattern of the emitter is thereby projected onto a substrate. To prevent dispersion of emitted electron beams, the electron beams may be controlled by a permanent magnet, an electro-magnet, or a deflector unit. A one-to-one or x-to-one projection of a desired pattern on the substrate is thereby obtained.

Description

technical field [0001] The present invention relates to an electron lithography apparatus using a patterned emitter, and more particularly, to an electron lithography apparatus using a thermoelectric plate on which is formed a patterned metal film layer. Background technique [0002] A device for ferroelectric switching lithography using a patterned emitter generates electrons by switching the patterned ferroelectric emitter to expose an electron resist on the substrate, forming the same The same desired pattern as the emitter pattern. However, a disadvantage of this ferroelectric conversion emission is that the electrodes formed on the emitter through the mask absorb electrons. Furthermore, the emitter cannot reliably emit electrons when it is not connected to the electrode. [0003] Lithographic equipment employing a thermionic source uses electricity and magnetic fields to steer an electron beam. However, in order to use a large-sized electron source, the lithographic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G01J5/06G03F7/20H01J37/00H01J37/317
CPCH01J37/3175H01J2237/31781B82Y10/00B82Y40/00
Inventor 金东煜柳寅儆文昌郁金仁淑
Owner SAMSUNG ELECTRONICS CO LTD