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Vacuum ionic film coater with gas ionic source arrangement

A gas ion source and coating machine technology, which is applied in vacuum evaporation coating, ion implantation coating, sputtering coating and other directions, can solve the problem that the gas ion source power supply is difficult to monitor the ignition phenomenon, and the plated workpiece is easy to arc hit. It can avoid the problems of fire and burn out the surface of the workpiece, so as to avoid the metal sputtering of the gas ion source target body, solve the problem of arc extinguishing failure, and reduce the cost of equipment.

Active Publication Date: 2007-04-25
北京丹普表面技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When arc ignition occurs on the surface of the workpiece, the workpiece bias power supply 7 will immediately start the arc extinguishing action (instantly cut off the power supply); while the gas ion source power supply is difficult to monitor the ignition phenomenon, and often cannot operate synchronously, and continues to output gas ions , so that the arc ignition on the workpiece can be maintained, and the surface of the workpiece is burned
Therefore, the conventional method of using two independent power supplies at the same time has the technical problem that the workpiece to be plated is easy to be ignited by an arc

Method used

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  • Vacuum ionic film coater with gas ionic source arrangement
  • Vacuum ionic film coater with gas ionic source arrangement
  • Vacuum ionic film coater with gas ionic source arrangement

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Experimental program
Comparison scheme
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Embodiment 1

[0034] The structure of the vacuum ion coating machine configured with a gas ion source in this embodiment is shown in FIG. 3 . The vacuum chamber 1 and the conductive workpiece (turret) frame 2 are the same as described in FIG. 2 . The wall of vacuum chamber 1 is well grounded (PE). The gas ion source 3 is the LISE574 / 102 anode laminar flow rectangular gas ion source produced by Beijing Tempur Surface Technology Co., Ltd. The DC power supply 4 is a pinnacle 10kW DC inverter power supply from AE Company of the United States. The three switches 71, 72, 81, 82 and 9 in Fig. 2 are selected as three identical SC-N2 (35) type AC contactors of Japan FUJI Company, corresponding to KM1, KM2 and KM3, all electrical wiring methods and Figure 2 shows the same.

[0035]The control circuit of the coating electromechanical wiring in this embodiment is shown in FIG. 4 . Among them, KM1, KM2 and KM3 represent the pull-in magnet wire package of the AC contactor. KM1: 4, KM2: 4 and KM3: 4 ...

Embodiment 2

[0042] The structure and working process of the vacuum ion coating machine equipped with a gas ion source in this embodiment are shown in FIG. 5 . Compared with the vacuum ion coating machine with gas ion source configuration shown in Figure 3, only a pair of LMI443 / 69 rectangular magnetron sputtering sources 18 and 19 produced by Beijing Tempor Surface Technology Co., Ltd. and American AE Company PEII 10kW intermediate frequency power supply 17. The two output electrodes of the intermediate frequency power supply 17 are respectively connected to the cathode electrodes of the magnetron sputtering sources 18 and 19 for driving a pair (two) of the magnetron sputtering sources 18 and 19 .

[0043] When the gas ion source 3 works alone, a positive voltage of several hundred volts (550-750v) is applied to the anode, and the plasma generated by the gas ion source 3 has a high positive potential; the plasma generated when the magnetron sputtering sources 18 and 19 work independently ...

Embodiment 3

[0047] The only difference between the vacuum ion coating machine configured with the gas ion source in this embodiment and Embodiment 2 is that the original DC power supply 4 is replaced by the pinnacle plus+10kW pulsed DC inverter power supply from AE Company of the United States. For the pulsed DC power supply applied on the gas ion source 3, its pulse frequency is set as 100kHz, and the pulse width is set as 2 microseconds, that is, the DC output duty cycle is 80%, which can completely suppress the arc ignition fast enough Produced, bringing the following more benefits to the entire vacuum ion coating machine:

[0048] 1) Due to the plasma oscillation caused by the periodic pulse, the start-up threshold voltage of the gas ion source is reduced, and the operating voltage is correspondingly reduced (50 to 100v). It is beneficial to improve discharge stability, improve working current and gas ionization efficiency.

[0049] 2) Due to the periodic "off" of the operating volta...

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Abstract

The invention was involved in vacuum ion coating machine accompanied by gas ion coating technology. The coating machine consists of a vacuum chamber, a conducting workpiece and a gas ion source and a DC / AC power supply. The power supply is used to drive the gas ion source and to establish minus bias for conducting workpiece frame separately by three groups of switches. The first and second groups consist of two simultaneous on-off switches with on-off status at the same time. The positive electrode of the power supply is connected with the positive electrode of gas ion source by one switch of the first group. At the same time, the positive electrode of the power supply is connected with the vacuum chamber by one switch of the second group. The positive electrode of the power supply is connected with the positive electrode of gas ion source by one switch of the first group. At the same time, the positive electrode of the power supply is connected with the vacuum chamber wall by one switch of the second group. The negative electrode of the power supple is connected with the conducting workpiece frame by the other switches of the first and second groups. The conducting workpiece frame and the vacuum chamber wall is separately connected with the two sides of the third switch. The method can use the functions of gas ion source and power supply to reduce the cost of the equipments.

Description

technical field [0001] The invention belongs to the technical field of vacuum ion coating, in particular to the improvement of a vacuum ion coating machine equipped with a gas ion source. Background technique [0002] In the application and development of vacuum ion coating technology, gas ion source has received more and more attention and attention. Due to the directionality of the gas ion source, high-density gas ions (plasma) are generated in its active area, which can be applied to the following aspects: (a) when the gas ion source is passed into an inert gas (such as argon), High-intensity gas ion bombardment cleaning can be performed on the surface of the workpiece. The cleaning process is concentrated in a local area of ​​action, and the energy density is much higher than that of ordinary argon ion glow bombardment; compared with cathodic arc metal ion bombardment, there is no side effect of contamination caused by metal particles coating the surface of the workpiec...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/46
Inventor 董骐杜建钟钢张首忠罗蓉平
Owner 北京丹普表面技术有限公司